ADVANCED ENERGY 3151801-004远程等离子源 PDF资料
1.产 品 资 料 介 绍：
ADVANCED ENERGY 3151801-004 远程等离子源产品特点
ADVANCED ENERGY 3151801-004 是一款用于半导体薄膜工艺的远程等离子源，集成高效电源与固态匹配技术，支持宽阻抗稳定运行，适用于腔室清洗与刻蚀工艺。
以下是该型号的主要特点：
NF₃解离效率高达98%以上。
固态主动匹配，阻抗范围宽。
适用于清洗、刻蚀、沉积工艺。
内置电源与匹配网络，结构紧凑。
100 mTorr至4 Torr范围可靠点火。
功率1000W至8000W连续可调。
高级监控电路，精确测量实际功率。
可选虚拟前面板软件，控制直观。
阳极硬化腔室，减少颗粒物。
8kW下仅需2 gpm冷却水。
兼容200/208V三相电源。
模拟及RS-232通信接口。
体积小巧，安装灵活。
支持连续满负荷运行。
MTBF超过450,000小时。
综上，ADVANCED ENERGY 3151801-004 凭借高效解离、宽工艺适应性、先进匹配技术和长期可靠性，是提升薄膜制造工艺效率的可靠选择。
ADVANCED ENERGY 3151801-004远程等离子源 英文介绍
ADVANCED ENERGY 3151801-004 Remote Plasma Source Product Features
ADVANCED ENERGY 3151801-004 is a remote plasma source for semiconductor thin film processes, integrating efficient power supply and solid-state matching technology, supporting stable operation with wide impedance, suitable for chamber cleaning and etching processes.
The following are the main features of this model:
The dissociation efficiency of NF ∝ is over 98%.
Solid state active matching, wide impedance range.
Suitable for cleaning, etching, and deposition processes.
Built in power supply and matching network, compact structure.
Reliable ignition within the range of 100 mTorr to 4 Torr.
The power can be continuously adjusted from 1000W to 8000W.
Advanced monitoring circuit for precise measurement of actual power.
Optional virtual front panel software for intuitive control.
Anode hardening chamber to reduce particulate matter.
Only 2 gpm of cooling water is required at 8kW.
Compatible with 200/208V three-phase power supply.
Simulate and RS-232 communication interface.
Compact size and flexible installation.
Support continuous full load operation.
MTBF exceeds 450000 hours.
In summary, ADVANCED ENERGY 3151801-004 is a reliable choice for improving the efficiency of thin film manufacturing processes due to its high dissociation efficiency, wide process adaptability, advanced matching technology, and long-term reliability.
ADVANCED ENERGY 3151801-004远程等离子源 产品展示
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