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Advanced Energy 3153137-934远程等离子体源

Advanced Energy 3153137-934远程等离子体源

Advanced Energy 3153137-934远程等离子体源 PDF资料 1.产 品 资 料 介 绍:Advanced Energy 3153137-934 是先进能源工业公司旗下一款远程等离子体源,主要用于半导体晶圆制造及光电领域,为腔室清洗、表面改性和薄膜蚀刻等工艺提供稳定的活性粒子源。中间13条特点品牌为Advanced Energy(先进能源工业公司),型号3153137-934。...

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Advanced Energy 3153137-934远程等离子体源

    Advanced Energy 3153137-934远程等离子体源 PDF资料 

    1.产 品 资 料 介 绍:

    Advanced Energy 3153137-934 是先进能源工业公司旗下一款远程等离子体源,主要用于半导体晶圆制造及光电领域,为腔室清洗、表面改性和薄膜蚀刻等工艺提供稳定的活性粒子源。

    中间13条特点

    1. 品牌为Advanced Energy(先进能源工业公司),型号3153137-934。

    2. 工作电压220V,输出频率50kHz,适配标准工业供电环境。

    3. 属于系统卡件模块,适配DCS、PLC及大型伺服控制系统。

    4. 安装在工艺腔室外,通过产生中性活性种参与工艺反应。

    5. 适用于半导体晶圆、DRAM、TFT-LCD面板、LED及PCB等制造领域。

    6. 可用于CVD腔室清洗、反应性蚀刻及反应性沉积等工艺场景。

    7. 模块化设计,便于在设备机柜中安装与后期维护。

    8. 兼容Ar、O₂、H₂、N₂、NF₃等多种工艺气体,化学兼容性好。

    9. 内置固态主动式匹配网络,可在较宽阻抗范围内稳定运行。

    10. 具备高级监控电路,可实时测量供给等离子体的实际功率。

    11. 采用阳极硬化与防腐金属源腔室设计,减少颗粒产生,延长寿命。

    12. 产品经过出厂功能测试,确保上机合格率与系统兼容性。

    13. 采用风冷散热设计,无需外接水冷,集成安装更加简便。

    结尾
    总体而言,Advanced Energy 3153137-934 远程等离子体源凭借成熟的等离子技术和稳定的工艺表现,为半导体及光电制造提供了可靠的硬件支持。具体参数请以官方技术手册为准。

    Advanced Energy 3153137-934远程等离子体源  英文介绍

    Advanced Energy 3153137-934 is a remote plasma source under Advanced Energy Industries, primarily used in semiconductor wafer manufacturing and optoelectronic fields, providing a stable source of active particles for processes such as chamber cleaning, surface modification, and thin film etching.

    13 characteristics in the middle

    The brand is Advanced Energy, model 3153137-934.

    Working voltage 220V, output frequency 50kHz, suitable for standard industrial power supply environment.

    Belonging to the system card module, it is compatible with DCS, PLC, and large-scale servo control systems.

    Installed outside the process chamber, it participates in process reactions by generating neutral active species.

    Suitable for manufacturing fields such as semiconductor wafers, DRAM, TFT-LCD panels, LEDs, and PCBs.

    Can be used for CVD chamber cleaning, reactive etching, and reactive deposition processes.

    Modular design, easy to install and maintain in equipment cabinets.

    Compatible with various process gases such as Ar, O ₂, H ₂, N ₂, NF ∝, etc., with good chemical compatibility.

    Built in solid-state active matching network, capable of stable operation over a wide impedance range.

    Equipped with advanced monitoring circuits, it can measure the actual power supplied to the plasma in real time.

    Adopting anode hardening and anti-corrosion metal source chamber design to reduce particle generation and extend service life.

    The product has undergone factory functional testing to ensure the machine qualification rate and system compatibility.

    Adopting an air-cooled cooling design, there is no need for external water cooling, making integrated installation easier.

    ending

    Overall, the Advanced Energy 3153137-934 remote plasma source provides reliable hardware support for semiconductor and optoelectronic manufacturing with mature plasma technology and stable process performance. Please refer to the official technical manual for specific parameters.

    Advanced Energy 3153137-934远程等离子体源 产品展示   

    3153137-934 (2).jpg

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    本篇文章出自瑞昌明盛自动化设备有限公司官网,转载请附上此链接:http://www.jiangxidcs  

    型号:Advanced Energy 3153137-934远程等离子体源


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