AMAT 0190-27355低温泵 PDF资料
1.产 品 资 料 介 绍：
AMAT 0190-27355低温泵作为Applied Materials ENDURA系列反应室的核心真空部件，具备以下15条主要产品特点：
中间15条：
专用于ENDURA平台的IMP Ti工艺腔室，配套12英寸晶圆制程。
采用低温冷凝原理，通过极低温表面捕获气体分子，实现高真空环境。
无需油封或机械旋转部件，属于洁净真空获得设备，避免工艺污染。
具备快速抽空能力，可满足半导体沉积与刻蚀工艺的高真空需求。
二级冷头设计，能够达到10^-7至10^-8 Torr量级的极限真空度。
内置再生加热功能，定期将捕获的气体释放排出，恢复抽气性能。
具备温度传感器接口，可实时监测冷头温度状态。
兼容氦气压缩机驱动，需外部压缩机组提供制冷动力。
全金属密封结构，漏率低，适用于高洁净度半导体环境。
法兰接口标准化，适配ENDURA腔体的专用安装位置。
具备震动隔离设计，减少对精密工艺过程的机械干扰。
支持现场再生操作，无需拆卸即可完成维护周期。
采用封闭式氦气循环制冷，无消耗性冷媒泄漏风险。
适用于溅射沉积、离子注入等对真空度要求严格的工艺环节。
作为AMAT原厂备件，与ENDURA控制系统具备完整兼容性。
结尾：
总结而言，AMAT 0190-27355低温泵具有无污染、高真空、快抽速和低震动四大核心优势，是维持ENDURA系列反应室工艺洁净度与稳定性的关键真空组件。
AMAT 0190-27355低温泵 英文介绍
The AMAT 0190-27355 cryogenic pump, as the core vacuum component of the Applied Materials ENDURA series reaction chamber, has the following 15 main product features:
Middle 15:
IMP Ti process chamber dedicated to ENDURA platform, supporting 12 inch wafer process.
By using the principle of low-temperature condensation, gas molecules are captured on extremely low-temperature surfaces to achieve a high vacuum environment.
No need for oil seals or mechanical rotating parts, it belongs to clean vacuum acquisition equipment, avoiding process pollution.
Capable of rapid evacuation, it can meet the high vacuum requirements of semiconductor deposition and etching processes.
The secondary cold head design can achieve a maximum vacuum degree of 10 ^ -7 to 10 ^ -8 Torr.
Built in regenerative heating function, regularly releasing and discharging captured gas to restore pumping performance.
Equipped with a temperature sensor interface, it can monitor the temperature status of the cold head in real time.
Compatible with helium compressor drive, requiring external compressor unit to provide refrigeration power.
All metal sealed structure with low leakage rate, suitable for high cleanliness semiconductor environments.
Standardization of flange interface to adapt to the dedicated installation position of ENDURA cavity.
Equipped with vibration isolation design to reduce mechanical interference to precision manufacturing processes.
Support on-site regeneration operation, maintenance cycle can be completed without disassembly.
Adopting a closed helium cycle refrigeration system, there is no risk of consumable refrigerant leakage.
Suitable for processes such as sputtering deposition and ion implantation that require strict vacuum requirements.
As an AMAT original spare part, it has complete compatibility with ENDURA control system.
Ending
In summary, the AMAT 0190-27355 cryogenic pump has four core advantages: pollution-free, high vacuum, fast pumping speed, and low vibration. It is a key vacuum component for maintaining the cleanliness and stability of the ENDURA series reaction chamber process.
AMAT 0190-27355低温泵 产品展示
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