TEL 3B87-003543-11加热器总成 PDF资料
1.产 品 资 料 介 绍：
TEL 3B87-003543-11 是东京电子（Tokyo Electron）半导体热处理设备中的专用加热器总成，主要用于扩散炉等高温工艺腔室，负责为晶圆加工过程提供精确、均匀的热量输出。
产品特点（15条）
专为 TEL 半导体热处理设备定制，属原厂系统级备件
推测适配 Alpha 系列或 NT 系列扩散炉等高温腔室
采用多区独立加热设计，实现温度均匀分布
加热元件推测为高性能合金或陶瓷材质，耐高温抗氧化
最高工作温度适配半导体扩散工艺需求
具备快速升温与降温响应能力
与 TEL 实时温度控制系统协同工作
支持多温区独立监测与控制
加热器表面负载功率经过优化，延长使用寿命
内置过热保护及温度传感器接口
结构设计兼容 TEL 原厂石英管及反应腔体
保温层设计减少热量散失，提升能效
适用于 4 英寸至 12 英寸晶圆工艺设备
可选配快速冷却单元，缩短工艺循环间隔
作为原厂部件，具备长期备件供应支持
结尾
3B87-003543-11 以精确的多区温控和高温稳定运行为核心优势，是 TEL 扩散炉系统中保障晶圆工艺均匀性的关键部件。
TEL 3B87-003543-11 is a dedicated heater assembly in Tokyo Electron's semiconductor heat treatment equipment, mainly used in high-temperature process chambers such as diffusion furnaces, responsible for providing precise and uniform heat output for wafer processing.
Product features (15 items)
Specially customized for TEL semiconductor heat treatment equipment, it is an original factory system level spare part
Speculation on adaptation to high temperature chambers such as Alpha series or NT series diffusion furnaces
Adopting a multi zone independent heating design to achieve uniform temperature distribution
The heating element is speculated to be made of high-performance alloy or ceramic material, with high temperature resistance and oxidation resistance
The maximum working temperature is suitable for semiconductor diffusion process requirements
Capable of rapid heating and cooling response
Collaborate with TEL real-time temperature control system
Support independent monitoring and control of multiple temperature zones
The surface load power of the heater has been optimized to extend its service life
Built in overheat protection and temperature sensor interface
Structural design compatible with TEL original quartz tube and reaction chamber
Insulation layer design reduces heat loss and improves energy efficiency
Suitable for wafer processing equipment ranging from 4 inches to 12 inches
Optional quick cooling unit to shorten the process cycle interval
As an original component, it has long-term spare parts supply support
ending
3B87-003543-11, with its core advantages of precise multi zone temperature control and stable high-temperature operation, is a key component in the TEL diffusion furnace system that ensures wafer process uniformity.
3.其他产品
GE IS420PUAAH1A 以太网交换机
A-B 1794-IRT8XT 继电器输出模块
A-B 1769-OF8C 电流模块
ROCKWELL TC-302-02-4M0 Fiber Optic Remote Expansion Cable
TeiKOOR PSMU-350-3 Communication Module
TeiKOOR CPCIAC-6U-500 Communication Module
| 489-P5-HI-A20-T-H | HZ171A601 | IC3600SVDB1 |
| 489-P5-HI-A20-T | HP56A60192 | IC3600SVDA1B |
| 489-P5-HI-A20-E-H | SS7-35B | IC3600TPAE1B |
| 489-P5-HI-A20-E | PSR45A-275 | IC3600TPAB1B |
| 489-P5-HI-A20 | SRB-MS-ILK5 | IC3600TPAB1 |
| 489-P5-HI-A1-E | SS2000OF | IC3600TPAA1A |
| 489-P1-LO-A20-E | SS2000M-D4 | IC3600TPAA1 |
本篇文章出自瑞昌明盛自动化设备有限公司官网，转载请附上此链接:http://www.jiangxidcs
