FEI GIS 26833-E控制器 PDF资料
FEI GIS 26833-E 是 FEI（现属赛默飞世尔）电子显微镜配套气体注入系统（Gas Injection System, GIS）的控制器模块，用于控制 GIS 的阀门开关、加热及气体流量，配合聚焦离子束（FIB）或扫描电镜（SEM）进行材料沉积或刻蚀。
应用领域
FEI 双束电镜的 GIS 控制
聚焦离子束诱导沉积工艺的气体控制
扫描电镜电子束诱导沉积的气体管理
气体辅助刻蚀工艺的阀门与时序控制
铂、钨、碳等前驱体气体的注入调节
绝缘体沉积工艺的气体流量管理
增强刻蚀工艺的气体供给控制
选择性碳铣削工艺的气体调节
GIS 加热坩埚的温度控制回路
GIS 针尖插入/缩回动作控制
多 GIS 通道的协同管理
真空腔内气体阀门的快速响应控制
半导体失效分析与 TEM 样品制备
材料科学中的微纳结构加工
老旧 FEI 电镜系统的 GIS 维护替换
综上，FEI GIS 26833-E 作为气体注入系统控制器，主要面向 FEI 电镜平台的 FIB/SEM 诱导沉积与刻蚀工艺中的气体供给控制场景。
FEI GIS 26833-E控制器 英文介绍
FEI GIS 26833-E is a controller module for the Gas Injection System (GIS) of FEI (now part of Thermo Fisher Scientific) electron microscope. It is used to control the valve opening, heating, and gas flow of the GIS, and is used in conjunction with Focused Ion Beam (FIB) or Scanning Electron Microscope (SEM) for material deposition or etching.
Application Areas
GIS Control of FEI Double Beam Electron Microscopy
Gas Control of Focused Ion Beam Induced Deposition Process
Gas Management of Scanning Electron Microscopy Electron Beam Induced Deposition
Valve and timing control of gas assisted etching process
Injection regulation of precursor gases such as platinum, tungsten, and carbon
Gas flow management of insulator deposition process
Gas supply control for enhanced etching process
Gas regulation for selective carbon milling process
Temperature control circuit for GIS heating crucible
GIS needle tip insertion/retraction action control
Collaborative management of multiple GIS channels
Rapid response control of gas valves in vacuum chambers
Semiconductor Failure Analysis and TEM Sample Preparation
Micro nano structure processing in materials science
GIS maintenance and replacement of old FEI electron microscopy system
In summary, FEI GIS 26833-E serves as a gas injection system controller mainly for gas supply control scenarios in FIB/SEM induced deposition and etching processes on the FEI electron microscopy platform.
FEI GIS 26833-E控制器 产品图片
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