Walchem WNI311-6N1镍控制器 PDF资料
Walchem WNI311-6N1 镍控制器
产品应用领域(10 条)
化学镀镍槽液镍浓度在线监测与控制
电镀产线自动添加药水,减少人工滴定
镀镍槽金属消耗量(MTO)统计与上限报警
可选配 pH 控制功能的镀镍槽酸碱度调节
电镀液浓度异常高位/低位报警
添加泵运行时间与加药量累计统计
镀镍槽液温度监测与补偿
与上位机或记录仪通过 4-20mA 信号联动
电镀设备维护与控制器备件替换
化学镀镍工艺的自动化加药系统集成
产品参数(5 条)
测量原理:光电式在线分析,光纤光电技术不受槽液老化、颜色变化影响
镍浓度范围:0.01~10 g/L(或 0.001~1.33 oz/gal),分辨率 0.001 g/L,精度 0.01 g/L
控制输出:最多 4 路继电器,用于镍浓度及可选 pH 控制;可选 4-20mA 隔离输出
防护等级:NEMA 4X(IP65),热塑性外壳,适用于电镀车间环境
电源规格:115 VAC ±15% 或 230 VAC ±15%,50/60 Hz
总结:Walchem WNI311-6N1 为 WNI 系列化学镀镍控制器,基于光电原理在线监测镍浓度并自动控制加药,适用于电镀产线的镀镍槽液管理与自动化加药系统。
Walchem WNI311-6N1 Nickel Controller
Product application areas (10 items)
Online monitoring and control of nickel concentration in electroless nickel plating bath solution
The electroplating production line automatically adds chemicals to reduce manual titration
Statistics and upper limit alarm of metal consumption (MTO) in nickel plating tank
PH adjustment of nickel plating tank with optional pH control function
Abnormal high/low level alarm for electroplating solution concentration
Accumulated statistics of pump running time and dosing amount
Temperature monitoring and compensation of nickel plating bath solution
Linkage with the upper computer or recorder through a 4-20mA signal
Maintenance of electroplating equipment and replacement of controller spare parts
Integration of automated dosing system for electroless nickel plating process
Product parameters (5 items)
Measurement principle: photoelectric online analysis, fiber optic photoelectric technology is not affected by the aging and color changes of the tank solution
Nickel concentration range: 0.01-10 g/L (or 0.001-1.33 oz/gal), resolution 0.001 g/L, accuracy 0.01 g/L
Control output: up to 4 relays for nickel concentration and optional pH control; Optional 4-20mA isolated output
Protection level: NEMA 4X (IP65), thermoplastic shell, suitable for electroplating workshop environment
Power specifications: 115 VAC ± 15% or 230 VAC ± 15%, 50/60 Hz
Summary: Walchem WNI311-6N1 is a WNI series electroless nickel plating controller that monitors nickel concentration online and automatically controls dosing based on photoelectric principles. It is suitable for nickel plating tank management and automated dosing systems in electroplating production lines.

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