AE VM1500AW射频匹配器 PDF资料
AE VM1500AW 射频匹配器
产品特点
属于 AE VarioMatch 系列，基于 VM 1000/1500 平台，用于将负载阻抗变换到 50 Ω，减少反射功率，确保射频电源功率完整输出。
采用 L 型匹配拓扑，调谐范围宽，能够匹配低阻抗负载。
配备真空可变电容器，耐高压击穿，可承受高达 67 A 的射频电流。
提供自动和手动两种调谐模式，自动模式快速精准，手动模式便于精细控制。
配备 15 针 VarioMatch 接口用于远程控制，支持 L 型和 Gamma 型两种拓扑配置。
应用领域
电容耦合等离子体工艺。
CO₂ 激光激励。
化学气相沉积。
物理气相沉积。
溅射工艺。
反应离子刻蚀。
等离子体增强化学气相沉积。
半导体制造中的射频功率匹配。
平板显示器生产线。
需要将射频电源功率高效传输至等离子体负载的工业场景。
总结
AE VM1500AW 是 VarioMatch 系列射频匹配器，调谐范围宽、耐高压大电流，主要服务于等离子体刻蚀、沉积及 CO₂ 激光激励等射频应用场景。
AE VM1500AW射频匹配器 英文介绍
AE VM1500AW RF Matcher
Product Features
Belonging to the AE VarioMatch series, based on the VM 1000/1500 platform, it is used to transform the load impedance to 50 Ω, reduce reflected power, and ensure complete output of RF power supply.
Adopting an L-shaped matching topology, with a wide tuning range, it can match low impedance loads.
Equipped with a vacuum variable capacitor, it is resistant to high voltage breakdown and can withstand RF currents up to 67 A.
Provide two tuning modes: automatic and manual. The automatic mode is fast and accurate, while the manual mode is easy to control finely.
Equipped with a 15 pin VarioMatch interface for remote control, supporting both L-shaped and Gamma topology configurations.
Application Areas
Capacitive coupled plasma technology.
CO ₂ laser excitation.
Chemical vapor deposition.
Physical vapor deposition.
Sputtering process.
Reactive ion etching.
Plasma enhanced chemical vapor deposition.
RF power matching in semiconductor manufacturing.
Flat panel display production line.
Industrial scenarios that require efficient transmission of RF power to plasma loads.
Summary
AE VM1500AW is a VarioMatch series RF matching device with a wide tuning range and high voltage and current resistance. It is mainly used in RF applications such as plasma etching, deposition, and CO ₂ laser excitation.
AE VM1500AW射频匹配器 产品图片
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