Hitachi 1-809004-C涡轮分子泵 PDF资料
Hitachi 1-809004-C 涡轮分子泵
产品概述
Hitachi 1-809004-C 是日立(Hitachi)相关的涡轮分子泵部件,实际对应岛津(Shimadzu)TMP 280-L 型号涡轮分子泵,采用 Fomblin 润滑,全新品,产地为日本。
应用领域(6条)
半导体制造设备:为刻蚀、沉积等工艺提供高真空环境
真空镀膜设备:用于溅射、蒸发等镀膜工艺的抽气系统
科研仪器:配合电子显微镜、表面分析设备使用
分析仪器:用于质谱仪等需要高真空的分析设备
MBE 分子束外延设备:为外延生长提供超高真空条件
通用高真空系统:各类需要洁净高真空的工业与科研场景
产品特点(5条)
原厂适配:对应岛津 TMP 280-L 型号,配套使用
Fomblin 润滑:采用耐腐蚀润滑剂,适合半导体工艺环境
高真空性能:涡轮分子泵结构,提供洁净高真空
全新品:New 状态,未使用
日本制造:品质稳定,可靠性高
总结
Hitachi 1-809004-C 涡轮分子泵对应岛津 TMP 280-L 型号,采用 Fomblin 润滑,广泛应用于半导体制造、真空镀膜及科研仪器等领域,具备原厂适配、洁净高真空和稳定可靠等特点,能有效保障高真空系统的正常运行。
Hitachi 1-809004-C涡轮分子泵 英文介绍
Hitachi 1-809004-C Turbomolecular Pump
Product Overview
Hitachi 1-809004-C is a turbomolecular pump component related to Hitachi, which actually corresponds to the Shimadzu TMP 280-L model turbomolecular pump. It uses Fomblin lubrication, is a new product, and is produced in Japan.
Application areas (6 items)
Semiconductor manufacturing equipment: providing high vacuum environment for etching, deposition and other processes
Vacuum coating equipment: an exhaust system used for coating processes such as sputtering and evaporation
Research instruments: used in conjunction with electron microscopes and surface analysis equipment
Analytical instrument: used for mass spectrometers and other analytical equipment that require high vacuum
MBE molecular beam epitaxy equipment: providing ultra-high vacuum conditions for epitaxial growth
Universal high vacuum system: various industrial and scientific research scenarios that require clean high vacuum
Product features (5 items)
Original factory adaptation: Corresponding to Shimadzu TMP 280-L model, compatible for use
Fomblin lubrication: using corrosion-resistant lubricants, suitable for semiconductor process environments
High vacuum performance: Turbomolecular pump structure, providing clean high vacuum
All new products: New status, unused
Made in Japan: Stable quality, high reliability
Summary
The Hitachi 1-809004-C turbomolecular pump corresponds to the Shimadzu TMP 280-L model and uses Fomblin lubrication. It is widely used in semiconductor manufacturing, vacuum coating, and scientific research instruments. It has the characteristics of factory adaptation, clean high vacuum, and stable reliability, which can effectively ensure the normal operation of high vacuum systems.

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