MKS OPT-50Z-00直流等离子体发生器 PDF资料
MKS OPT-50Z-00 直流等离子体发生器
产品概述
MKS OPT-50Z-00 是 MKS Instruments 生产的 Optima 系列直流等离子体发生器（DC Plasma Generator），对应型号为 DCG-200Z Optima，专为半导体溅射工艺设计，产地为美国。
应用领域（6条）
半导体溅射设备：为 PVD 磁控溅射提供直流等离子体功率
集成电路制造：用于薄膜沉积工艺的等离子体激发
存储媒介制造：硬盘等存储介质的薄膜溅射
平板显示器制造：TFT-LCD 等面板的溅射镀膜
太阳能电池制造：光伏薄膜沉积工艺
薄膜涂层设备：各类工业镀膜系统的等离子体电源
产品特点（5条）
优质电弧控制：具备先进的电弧检测与抑制能力，减少工艺中断
高输出功率：50 kW 功率等级，满足高速溅射需求
高可重复性：输出稳定一致，保障工艺结果的一致性
接口灵活：支持多种通信和控制接口，便于系统集成
工业级设计：适配 AMAT 等主流半导体设备平台
总结
MKS OPT-50Z-00 直流等离子体发生器是 MKS Optima 系列的核心产品，广泛应用于半导体溅射、集成电路、显示面板及太阳能电池等领域，具备优质电弧控制、高输出功率和高可重复性等特点，能有效保障溅射镀膜工艺的稳定性与效率。
MKS OPT-50Z-00直流等离子体发生器 英文介绍
MKS OPT-50Z-00 DC plasma generator
Product Overview
MKS OPT-50Z-00 is an Optima series DC Plasma Generator produced by MKS Instruments, with the corresponding model DCG-200Z Optima. It is designed specifically for semiconductor sputtering processes and is produced in the United States.
Application areas (6 items)
Semiconductor sputtering equipment: providing DC plasma power for PVD magnetron sputtering
Integrated Circuit Manufacturing: Plasma Excitation for Thin Film Deposition Processes
Manufacturing of storage media: thin film sputtering of storage media such as hard drives
Flat panel display manufacturing: sputtering coating of TFT-LCD and other panels
Solar cell manufacturing: photovoltaic thin film deposition process
Thin film coating equipment: plasma power supply for various industrial coating systems
Product features (5 items)
High quality arc control: equipped with advanced arc detection and suppression capabilities, reducing process interruptions
High output power: 50 kW power level, meeting high-speed sputtering requirements
High repeatability: stable and consistent output, ensuring consistency of process results
Flexible interface: supports multiple communication and control interfaces, facilitating system integration
Industrial grade design: compatible with mainstream semiconductor equipment platforms such as AMAT
Summary
The MKS OPT-50Z-00 DC plasma generator is the core product of the MKS Optima series, widely used in fields such as semiconductor sputtering, integrated circuits, display panels, and solar cells. It features high-quality arc control, high output power, and high repeatability, effectively ensuring the stability and efficiency of sputtering coating processes.
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| PMB33C-10114-01 | 70 SK 36b-E | P22NSHA-LNF-NS-03 |
| PMB33C-10114-00 | IIMKM01A | M21NSHS-LNN-NS-02 |
| PMB33C-10101-03 | 07MK62 | N33HRFL-LNK-NS-00 |
| PMB33C-10101-02 | NKTU111 | N33HCHK-LNS-NS-02 |
| PMB33C-10101-01 | AMAT 0100-35083 | 57160001-NF DSDO 115 |
| PMB33C-10101-00 | AMAT 0100-00024 | P22NSXB-LNN-NS-05 |
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