AE 3152012-043电源模块 PDF资料
AE 3152012-043 这个电源模块,说白了就是给半导体和真空镀膜设备供电用的,专门负责磁控溅射那块。
它有哪些特点
功率有 10kW,够大
调节很精准,工艺做出来稳定
输出端存的能量少,用起来更安全
自带灭弧电路,电弧不容易伤到设备
恒压、恒流、恒功率三种模式随便选
可以当从机,跟主机并起来扩功率
就是为真空环境长时间干活设计的
效率高,能到 90% 以上
过压、过流、过功率都有保护
体积不大,装起来、换起来都方便
都用在哪些地方
直流磁控溅射镀膜
射频溅射和蚀刻系统
半导体制造设备
难沉积材料的高速镀膜
实验室和小型研发用的真空系统
总的来说,要求高的真空镀膜工艺想找个稳定、皮实、保护全的供电模块,AE 3152012-043 就是个靠谱的选择。
AE 3152012-043电源模块 英文介绍
The AE 3152012-043 power module is designed to supply power to semiconductor and vacuum coating equipment, specifically responsible for magnetron sputtering.
What are its characteristics
The power is 10kW, which is large enough
The adjustment is very precise, and the process is stable
Less energy stored at the output end, safer to use
Equipped with an arc extinguishing circuit, the arc is less likely to damage the equipment
Choose from three modes: constant voltage, constant current, and constant power
It can be used as a slave and combined with the host to expand power
It is designed for working in a vacuum environment for a long time
High efficiency, able to reach over 90%
Overvoltage, over-current, and over-power are all protected
Not large in size, easy to install and replace
Where are they used
DC magnetron sputtering coating
RF sputtering and etching system
Semiconductor manufacturing equipment
High speed coating of difficult to deposit materials
Vacuum systems for laboratory and small-scale research and development
Overall, AE 3152012-043 is a reliable choice for high demand vacuum coating processes looking for a stable, robust, and fully protected power supply module.
AE 3152012-043电源模块 产品图片

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| PXIe-8521 | R32GNC-HS-ND-VS-00 | R43GCNA-R2-NS-NV-00 |
| PXIe-8430/16 | R33GENC-TS-NS-VS-00 | R24GENA-R1-NS-NV-00 |
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