Zygo 8020-0237-01 控制器模块 PDF资料
1.产 品 资 料 介 绍：
Zygo 8020-0237-01 控制器模块
产品特点
属于Zygo ZMI 501A系列位移测量干涉仪系统的测量电子模块。
可输出正交或上/下脉冲及24位数字测量数据。
每块板卡支持2轴测量，可灵活配置多通道系统。
最大位置分辨率可达λ/512，约1.24纳米。
最大位置测量范围可达±10.6米。
最大目标反射镜移动速度为475 mm/秒。
数据速率可在3至24 MHz之间选择。
采用光纤式干涉测量技术，支持灵活传感器布局。
供电要求为+5.2 VDC，电流3.3 A。
工作温度范围为0至40℃，湿度为0至85%无冷凝。
应用领域
半导体制造设备中的晶圆载台位置反馈与控制。
光刻机中的掩模版台精密定位。
精密运动平台的位置测量与反馈。
光学元件检测与计量系统中的位移测量。
科研实验室中高精度位移测量实验装置。
定制化OEM精密系统中的高分辨率位置反馈。
总结
8020-0237-01是Zygo ZMI 501A干涉仪系统的核心测量模块，以纳米级分辨率、大测量范围及多轴支持为核心优势，主要用于半导体制造、精密计量和科研领域中对位移和位置有极高要求的应用场景。
Zygo 8020-0237-01 Controller Module
Product Features
The measurement electronic module belongs to the Zygo ZMI 501A series displacement measurement interferometer system.
Can output orthogonal or up/down pulses and 24 bit digital measurement data.
Each board supports 2-axis measurement and can flexibly configure multi-channel systems.
The maximum position resolution can reach λ/512, approximately 1.24 nanometers.
The maximum position measurement range can reach ± 10.6 meters.
The maximum target mirror movement speed is 475 mm/s.
The data rate can be selected between 3 and 24 MHz.
Adopting fiber optic interferometric measurement technology, supporting flexible sensor layout.
The power supply requirement is+5.2 VDC, with a current of 3.3 A.
The working temperature range is 0 to 40 ℃, and the humidity is 0 to 85% without condensation.
Application Domain
Feedback and control of wafer stage position in semiconductor manufacturing equipment.
Precision positioning of the mask stage in the lithography machine.
Position measurement and feedback of precision motion platform.
Displacement measurement in optical component detection and measurement systems.
High precision displacement measurement experimental device in scientific research laboratory.
High resolution position feedback in customized OEM precision systems.
summary
8020-0237-01 is the core measurement module of Zygo ZMI 501A interferometer system, with nanometer resolution, large measurement range, and multi axis support as its core advantages. It is mainly used in applications with extremely high requirements for displacement and position in semiconductor manufacturing, precision metrology, and scientific research fields.
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