ENI RPDG-20ENI RPDG-200Z-12029直流等离子体发生器 PDF资料
这个 ENI RPDG-200Z-12029 是 ENI 家 Optima 系列的直流等离子体发生器，20kW 等级，配合 AMAT 机台使用。下面简单说说。
产品特点
ENI 原厂出品，属于 Optima DCG-200Z 系列，带 CE 认证。
输出功率 20kW 等级，给工艺腔体提供直流等离子体能量。
跟 AMAT 机台配套使用，AMAT 零件号 0190-60303，兼容性好。
采用先进电路设计，能降低电弧放电能量，保护靶材和工艺稳定。
模块化设计，跟 ENI 主电源配套使用，插上就能通信。
产品参数
品牌：ENI，现在归 MKS Instruments 旗下。
型号：DCG-200Z Optima。
零件号：RPDG-200Z-12029，对应 AMAT 0190-60303。
输出功率：20kW 等级。
类型：直流等离子体发生器，DC Source。
产品应用领域
半导体溅射系统，给 PVD 腔体提供直流等离子体电源。
等离子体处理设备，激发和维持等离子体。
真空镀膜产线，配合主电源做功率输出。
工业镀膜设备，真空腔体的等离子体电源。
设备维修替换，等离子体发生器坏了拿来换。
总的来说，ENI RPDG-200Z-12029 就是 Optima DCG-200Z 系列的直流等离子体发生器，20kW 等级，半导体溅射和镀膜设备上用的直流电源。
ENI RPDG-20ENI RPDG-200Z-12029直流等离子体发生器 英文介绍
This ENI RPDG-200Z-12029 is a DC plasma generator from ENI Optima series, rated at 20kW, used in conjunction with AMAT machines. Below is a brief explanation.
Product Features
Produced by ENI, belonging to the Optima DCG-200Z series, with CE certification.
Output power of 20kW level, providing DC plasma energy to the process chamber.
Used in conjunction with AMAT machine, AMAT part number 0190-60303, with good compatibility.
Adopting advanced circuit design can reduce arc discharge energy, protect target materials and process stability.
Modular design, compatible with ENI main power supply, can be plugged in for communication.
Product Specifications
Brand: ENI, now under the umbrella of MKS Instruments.
Model: DCG-200Z Optima.
Part number: RPDG-200Z-12029, corresponding to AMAT 0190-60303.
Output power: 20kW level.
Type: DC plasma generator, DC Source。
Product application areas
The semiconductor sputtering system provides DC plasma power to the PVD chamber.
Plasma processing equipment for exciting and maintaining plasma.
Vacuum coating production line, coupled with the main power supply for power output.
Industrial coating equipment, plasma power supply for vacuum chambers.
Equipment maintenance and replacement, replace the damaged plasma generator.
Overall, ENI RPDG-200Z-12029 is the Optima DCG-200Z series DC plasma generator, rated at 20kW, used as a DC power supply for semiconductor sputtering and coating equipment.
ENI RPDG-20ENI RPDG-200Z-12029直流等离子体发生器 产品图片
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| 345-L-P0-G0-H-E-M-N-N-SN-N-N | 531X300CCHAWM3 | IMCIS22 |
| 345-E-P5-G5-L-E-S-N-N-1E-D-H | 531X300CCHATM3 | IC3603A177AF6 |
| 345-E-P5-G5-H-E-S-N-N-SN-D-N | 531X300CCHASM3 | IC3603A177AF2 |
| 345-E-P5-G5-H-E-S-N-N-3E-D-N | 531X300CCHANM3 | IC3603A177AD2 |
| 345-E-P5-G5-H-E-S-N-N-1E-D-H | 531X300CCHAMM3 | IC3603A177AB2 |
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