Mitsubishi FT-1001D-W211涡轮分子泵 PDF资料
聊到三菱这款 FT-1001D-W211 涡轮分子泵,它就像车间里那种话不多但特别靠谱的老师傅,平时不声不响,关键时刻从不掉链子。下面简单说说它的特点、参数和用途。
产品特点
残压稳,实际工况下能长期稳定在十万分之一帕这个级别。
转子耐造,陶瓷涂层钢制结构,没异常噪音和振动就能用很久。
待机工况友好,长时间保持真空待机,状态衰减很慢。
不挑活,半导体产线和普通蒸发台都能适配。
状态判断看振动值和残压,这两个指标不飘就能继续用。
产品参数
抽速大约六百升每秒。
极限理论值一亿分之一帕,实际长期稳定在千万分之一帕。
常见于东京电子 Trias CVD 等系统拆机件,产地日本。
磁轴承设计,控制装置会自动检测安装方向并调整参数。
采用陶瓷涂层钢制转子,属于工业产线里的主力机型。
应用领域
半导体制造,尤其化学气相沉积工序。
科研实验室,比如电子束蒸发系统。
薄膜镀膜产线,光伏和光学镀膜都能用。
工业镀膜与表面处理,需要长时间抽气且对残压敏感的场景。
老旧设备维保替代,原厂新泵贵或货期长时的性价比选择。
总的来说,它不是娇贵的实验室玩具,而是能在车间里默默转好几年的基础装备。只要系统没报警、残压没漂、振动没超标,它一般就不会给你添麻烦。
Mitsubishi FT-1001D-W211涡轮分子泵 英文介绍
When it comes to Mitsubishi's FT-1001D-W211 turbomolecular pump, it's like the kind of reliable master in the workshop who doesn't speak much, usually silent and never loses control in critical moments. Below is a brief description of its characteristics, parameters, and uses.
Product Features
Residual pressure is stable, and it can remain stable at the level of one hundred thousandth of a pascal for a long time under actual working conditions.
The rotor is durable and made of ceramic coated steel structure, which can be used for a long time without abnormal noise and vibration.
Friendly standby mode, maintaining vacuum standby for a long time with slow state decay.
Not picky, both semiconductor production lines and ordinary evaporation stations can be adapted.
The state judgment depends on the vibration value and residual voltage. If these two indicators do not drift, they can continue to be used.
Product Specifications
The pumping speed is about 600 liters per second.
The theoretical limit value is one hundred millionth of a pascal, but in reality, it remains stable at one millionth of a pascal over the long term.
Commonly seen in disassembly parts of Tokyo Electronics Trias CVD and other systems, originating from Japan.
Magnetic bearing design, the control device will automatically detect the installation direction and adjust parameters.
The ceramic coated steel rotor is the main model in industrial production lines.
Application Areas
Semiconductor manufacturing, especially chemical vapor deposition processes.
Research laboratories, such as electron beam evaporation systems.
The thin film coating production line can be used for both photovoltaic and optical coating.
Industrial coating and surface treatment require prolonged pumping and are sensitive to residual pressure.
Old equipment maintenance replacement, cost-effective choice for expensive or long lead time original pumps.
Overall, it is not a delicate laboratory toy, but a basic equipment that can silently rotate in the workshop for several years. As long as the system does not alarm, residual pressure does not float, and vibration does not exceed the standard, it generally will not cause any trouble for you.
Mitsubishi FT-1001D-W211涡轮分子泵 产品图片

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| 6ES5490-7LA21 | CACR-330-FF1VBDY71 | 60-0055-01 |
| 6ES5482-7LF21 | CACR-SR20BE | 61-0124-03 |
| 6ES5477-8EC11 | CACR-SR15BE13S | 5341852 |
| 6ES5470-7LC13 | CACR-SR06TZ9SMY02A | 3BHB005171R0101 |
| 6ES5470-7LC12 | CACR-PR30BC3AFY | 3HAB8101-19 DSQC545A |
| 6ES5470-7LB13 | CACR-SR05BB1BF | 6SC6101-2B-Z |
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