Varian E11049670半导体设备 PDF资料
Varian E11049670是Varian Semiconductor Equipment公司的一款聚焦法拉第杯(Focus Faraday Cup),用于离子注入机中测量离子束的束流和分布。Varian Semiconductor后来被Applied Materials收购,该部件属于收购前的原厂产品。
5条产品特点
属于Varian离子注入机的束流测量组件,具体为聚焦法拉第杯
用于离子注入工艺中测量离子束的束流强度和分布
版本为Rev. 2,属于原厂工作件,外观有使用痕迹但功能正常
属于可替换的维修备件,用于离子注入设备维护
Varian Semiconductor后被Applied Materials收购,该部件属于收购前的原厂产品
5条产品参数
型号:E11049670
品牌:Varian Semiconductor Equipment
产品类型:聚焦法拉第杯(Focus Faraday Cup)
版本:Rev. 2
成色:工作件
5个应用领域
半导体离子注入设备
离子束流测量与监测
离子注入机维修与翻新
晶圆制造产线维护
半导体设备替换备件
总的来说,Varian E11049670是一款用于离子注入机的聚焦法拉第杯,主要功能是测量离子束的束流参数。Varian Semiconductor后来被Applied Materials收购,这个部件是离子注入设备维护中的常见替换件。
The Varian E11049670 is a Focus Faraday Cup from Varian Semiconductor Equipment, used for measuring the beam current and distribution of ion beams in ion implantation machines. Varian Semiconductor was later acquired by Applied Materials, and the component belonged to the original factory product before the acquisition.
5 Product Features
The beam measurement component belonging to Varian ion implantation machine, specifically the focusing Faraday cup
Used for measuring the beam intensity and distribution of ion beams in ion implantation processes
Version is Rev. 2, which belongs to the original factory workpiece. There are traces of use on the appearance, but the function is normal
Belonging to replaceable maintenance spare parts, used for ion implantation equipment maintenance
Varian Semiconductor was later acquired by Applied Materials, and the component belonged to the original factory product before the acquisition
5 product parameters
Model: E11049670
Brand: Varian Semiconductor Equipment
Product type: Focus Faraday Cup
Version: Rev. 2
Condition: Workpiece
5 application areas
Semiconductor ion implantation equipment
Ion beam measurement and monitoring
Ion implantation machine maintenance and refurbishment
Maintenance of wafer manufacturing production line
Replacement parts for semiconductor equipment
Overall, the Varian E11049670 is a focused Faraday cup used in ion implantation machines, primarily for measuring the beam parameters of ion beams. Varian Semiconductor was later acquired by Applied Materials, and this component is a common replacement for ion implantation equipment maintenance.

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