3152419-206射频发电机 PDF资料
1.产 品 资 料 介 绍:
3152419-206射频发电机 英文介绍
3152419-206 RF Generator Product Application Fields:
semiconductor manufacturing
Used for plasma excitation and power supply in processes such as etching, deposition, and cleaning.
Flat panel display and optoelectronic industry
Thin film deposition and plasma treatment processes applied in the manufacturing of LCD, OLED and other panels.
Vacuum and plasma process equipment
Provide stable and controllable RF power output for the plasma system inside the vacuum chamber.
Material surface treatment
Used for surface modification, coating treatment, plasma cleaning, and activation to improve material properties.
Research and Laboratory Applications
Plasma experiments, material research, and process development in universities and research institutions.
Medical and Biotechnology
Plasma medical equipment, sterilization equipment, and systems related to biological material processing.
Photovoltaic and new energy industry
Plasma etching and thin film deposition processes in solar cell manufacturing.
Vacuum coating and coating equipment
RF power sources in PVD, CVD and other equipment ensure coating quality and consistency.
Industrial cleaning and processing equipment
Used for plasma cleaning and processing of precision devices and electronic components.
3152419-206射频发电机 产品展示

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| PMB33C-20116-03 | AMAT 0100-09058 | M22NRXA-JDF-M1-00 |
| PMB33C-20116-02 | IMPCC01 | M22NSXA-LDN-M1-02 |
| PMB33C-20116-01 | 70 EA 02a-E | M22NRXB-LNF-NS-00 |
| PMB33C-20116-00 | AMAT 0100-35067 | PFTL201D 100.0KN 3BSE008922R100 |
| PMB33C-20114-03 | FLEXIBLE 353-0496G | 57160001-HA DSDO 160 |
| PMB33C-20114-02 | AMAT 0100-01352 | N34HRFL-LNK-NS-00 |
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