Nikon 4S013-284光学平台组件 PDF资料
Nikon 4S013-284是尼康光刻机中的光学平台组件，具体为S-Pure Revolver NAILL光学平台总成，主要配套NSR-S204B步进重复扫描系统使用。
5条产品特点
属于尼康NSR系列光刻机的原装光学平台组件，从NSR-S204B系统拆取
采用S-Pure Revolver NAILL光学平台设计，属于精密光学总成
属于二手工作件，外观有使用痕迹，但功能正常
日本制造，适配尼康光刻机标准安装结构
常见于半导体设备备件市场，属于可替换的维修件
5条产品参数
型号：4S013-284
产品类型：光学平台组件（Optics Platform Assembly）
具体名称：S-Pure Revolver NAILL Optics Platform Assembly
适用设备：Nikon NSR-S204B
产地：日本
5个应用领域
半导体光刻设备
NSR-S204B光刻机维修与翻新
晶圆制造产线维护
光学系统组件替换
二手半导体设备备件
总的来说，Nikon 4S013-284是尼康NSR-S204B光刻机上的S-Pure Revolver NAILL光学平台组件，属于精密光学总成，在设备内部承担光学成像相关的功能，是光刻机稳定运行的关键组件之一。
Nikon 4S013-284 is an optical platform component in Nikon lithography machines, specifically the S-Pure Revolver NAILL optical platform assembly, mainly used in conjunction with the NSR-S204B stepper repeat scanning system.
5 Product Features
Original optical platform components belonging to Nikon NSR series lithography machines, removed from NSR-S204B system
Adopting the S-Pure Revolver NAILL optical platform design, it belongs to the precision optical assembly
Belonging to second-hand work pieces, with signs of use on the exterior, but functioning normally
Made in Japan, compatible with Nikon lithography machine standard installation structure
Commonly seen in the semiconductor equipment spare parts market, it belongs to replaceable repair parts
5 product parameters
Model: 4S013-284
Product Type: Optics Platform Assembly
Specific name: S-Pure Revolver NAILL Optics Platform Assembly
Applicable equipment: Nikon NSR-S204B
Origin: Japan
5 application areas
Semiconductor lithography equipment
NSR-S204B lithography machine maintenance and refurbishment
Maintenance of wafer manufacturing production line
Replacement of optical system components
Second hand semiconductor equipment spare parts
Overall, Nikon 4S013-284 is the S-Pure Revolver NAILL optical platform component on the Nikon NSR-S204B lithography machine. It is a precision optical assembly that performs optical imaging related functions inside the equipment and is one of the key components for stable operation of the lithography machine.
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