Paramount 3156330-116射频发生器 PDF资料
Paramount 3156330-116是Advanced Energy旗下Paramount 3013系列的一款射频发生器,输出功率3000W,频率13.56MHz,配套AMAT应用材料设备使用。
5条产品特点
属于Paramount 3013系列,全数字控制架构,响应速度快
输出功率3000W,频率13.56MHz,适合等离子体工艺需求
支持脉冲射频功能,可实现精确的脉冲功率控制
具备实时功率和阻抗测量能力,能动态响应等离子体变化
配套AMAT应用材料设备使用,客户件号0190-44074-002
5条产品参数
型号:3156330-116
产品系列:Paramount 3013
输出功率:3000W
输出频率:13.56MHz
客户件号:0190-44074-002
5个应用领域
半导体等离子体蚀刻设备
等离子体增强化学气相沉积
高密度等离子体CVD设备
半导体设备维修与翻新
真空镀膜与薄膜沉积设备
总的来说,Paramount 3156330-116是Advanced Energy Paramount 3013系列的一款3000W、13.56MHz射频发生器,配套AMAT应用材料设备使用,在半导体等离子体工艺中承担射频功率输出任务
Paramount 3156330-116射频发生器 英文介绍
Paramount 3156330-116 is an RF generator from the Paramount 3013 series under Advanced Energy, with an output power of 3000W and a frequency of 13.56MHz, used in conjunction with AMAT application materials equipment.
5 Product Features
Belonging to the Paramount 3013 series, with a fully digital control architecture and fast response speed
Output power 3000W, frequency 13.56MHz, suitable for plasma process requirements
Supports pulse RF function, enabling precise pulse power control
Capable of real-time power and impedance measurement, able to dynamically respond to plasma changes
Supporting AMAT application materials and equipment use, customer part number 0190-44074-002
5 product parameters
Model: 3156330-116
Product Series: Paramount 3013
Output power: 3000W
Output frequency: 13.56MHz
Customer part number: 0190-44074-002
5 application areas
Semiconductor plasma etching equipment
Plasma enhanced chemical vapor deposition
High density plasma CVD equipment
Semiconductor equipment maintenance and refurbishment
Vacuum coating and thin film deposition equipment
In general, Paramount 3156330-116 is a 3000W, 13.56MHz RF generator from the Advanced Energy Paramount 3013 series, used in conjunction with AMAT application material equipment to undertake RF power output tasks in semiconductor plasma processes

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