DAIHEN SR-204333 射频匹配器 PDF资料
1.产 品 资 料 介 绍：
DAIHEN SR-204333 射频匹配器产品特点
DAIHEN SR-204333 是一款 13.56MHz、5kW 的射频自动匹配器，适用于半导体等离子体刻蚀、PECVD 等工艺。以下是该型号的 15 项核心特点：
工作频率 13.56MHz，适配标准射频工艺需求。
额定功率 5kW，满足中高功率制程要求。
自动阻抗匹配，快速将负载阻抗调至 50Ω 标准。
有效抑制反射功率，提升射频能量传输效率。
内置高精度功率采样，实时监测入射与反射功率。
匹配响应速度快，确保等离子体稳定起弧。
具备过功率、过温、驻波比超标等多重保护功能。
支持标准通信接口，可与射频电源及设备主控联动。
内部精密可调电容/电感模块，匹配范围宽泛。
腔体阻抗波动时自动快速跟踪调节参数。
壳体洁净防尘设计，符合无尘车间使用标准。
故障代码自检，快速定位匹配电路异常。
整机屏蔽结构，有效抑制对周边电路的射频干扰。
采用水冷/风冷散热设计，支持长期稳定运行。
出厂工艺校准，上机无需复杂参数调试。
总之，DAIHEN SR-204333 凭借精准的自动匹配能力、完善的多重保护机制以及针对半导体工艺环境的优化设计，是实现射频功率高效传输、保障等离子体工艺稳定性的可靠选择。
DAIHEN SR-204333 RF Matcher Product Features
DAIHEN SR-204333 is a 13.56MHz, 5kW RF automatic matching device suitable for semiconductor plasma etching, PECVD and other processes. Here are the 15 core features of this model:
Operating frequency of 13.56MHz, suitable for standard RF process requirements.
Rated power of 5kW, meeting the requirements of medium to high power processes.
Automatic impedance matching, quickly adjust the load impedance to 50 Ω standard.
Effectively suppress reflected power and improve RF energy transmission efficiency.
Built in high-precision power sampling, real-time monitoring of incident and reflected power.
Fast matching response speed ensures stable plasma arc initiation.
It has multiple protection functions such as over power, over temperature, and standing wave ratio exceeding the standard.
Supports standard communication interfaces and can be linked with RF power supplies and device controllers.
Internal precision adjustable capacitor/inductor module, with a wide matching range.
Automatically and quickly track and adjust parameters when the impedance of the cavity fluctuates.
The shell is designed to be clean and dust-proof, meeting the standards for use in dust-free workshops.
Fault code self check, quickly locate matching circuit abnormalities.
The overall shielding structure effectively suppresses radio frequency interference to surrounding circuits.
Adopting water-cooled/air-cooled heat dissipation design, supporting long-term stable operation.
Factory process calibration, no need for complex parameter debugging on the machine.
In summary, DAIHEN SR-204333 is a reliable choice for achieving efficient RF power transmission and ensuring plasma process stability, thanks to its precise automatic matching capability, comprehensive multiple protection mechanisms, and optimized design for semiconductor process environments.
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