853-064887-061射频匹配器 PDF资料
1.产 品 资 料 介 绍：
853-064887-061 是一款射频匹配器（RF Matching Unit），主要用于射频系统中实现负载阻抗与射频电源之间的匹配，以提高功率传输效率并保护射频源稳定运行。该类设备在等离子体、半导体制造及高频工业应用中非常常见。
基本功能
阻抗匹配
自动或半自动调整匹配网络，使负载阻抗与射频电源输出阻抗一致。
最大限度减少反射功率，提高能量利用率。
射频功率优化
保证射频功率稳定传输到负载端。
减少因失配导致的功率损耗和系统波动。
射频源保护
当负载变化或异常时，降低反射功率对射频发生器的冲击。
有助于延长射频电源及相关器件的使用寿命。
工业级可靠性
适用于连续运行环境，结构稳固，抗干扰能力强。
可在高功率、高频条件下长期稳定工作。
典型应用场景
半导体制造设备（刻蚀、沉积、等离子体工艺）
真空镀膜与等离子清洗设备
高频加热与等离子体处理系统
其他需要稳定射频功率传输的工业系统
853-064887-061射频匹配器 英文介绍
853-064887-061 is an RF Matching Unit mainly used in RF systems to match the load impedance with the RF power supply, in order to improve power transmission efficiency and protect the stable operation of the RF source. This type of equipment is very common in plasma, semiconductor manufacturing, and high-frequency industrial applications.
Basic functions
impedance matching
Automatically or semi automatically adjust the matching network to match the load impedance with the output impedance of the RF power supply.
Minimize reflected power and improve energy utilization efficiency.
RF power optimization
Ensure stable transmission of RF power to the load end.
Reduce power loss and system fluctuations caused by mismatches.
RF source protection
Reduce the impact of reflected power on the RF generator when the load changes or is abnormal.
Helps to extend the service life of RF power supplies and related devices.
Industrial grade reliability
Suitable for continuous operation environment, with stable structure and strong anti-interference ability.
Can work stably for a long time under high power and high frequency conditions.
Typical application scenarios
Semiconductor manufacturing equipment (etching, deposition, plasma processes)
Vacuum coating and plasma cleaning equipment
High frequency heating and plasma processing system
Other industrial systems that require stable RF power transmission
853-064887-061射频匹配器 产品展示
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