Koshuha MBA-010-H-2射频匹配箱 PDF资料
搞半导体的都知道,射频匹配箱这东西,看着不起眼,但要是调不好,整个工艺参数全得乱套。Koshuha MBA-010-H-2射频匹配箱,就是专干这个精细活的——把射频电源和负载之间的阻抗给撮合到一块儿,让功率老老实实往腔室里送。
5个特点
自动匹配,不用人管:内置自动匹配算法,根据腔室内的负载变化实时调整,不用人工去拧,省心省力。
响应速度快:匹配时间短,工艺开始瞬间就能把阻抗调稳,不影响工艺一致性。
适应多种工艺气体:不管是刻蚀还是沉积,面对不同气体种类和压力变化,都能稳定匹配。
散热设计到位:内部结构考虑了散热需求,长时间大功率工作也不容易过热掉链子。
接口标准,好接线:射频输入输出接口采用通用规格,和主流射频电源及腔室都能顺利对接。
5个参数
品牌/型号:Koshuha / MBA-010-H-2
产品类型:自动射频匹配箱
核心功能:射频阻抗自动匹配
适用场景:半导体工艺设备的射频传输系统
品牌归属:Koshuha(日本专业射频设备品牌)
5个应用领域
半导体刻蚀(Etch)设备
化学气相沉积(CVD)设备
物理气相沉积(PVD)设备
等离子体清洗设备
其他需要射频等离子体激励的半导体工艺
结尾
说白了,Koshuha MBA-010-H-2就是个“撮合人”——把射频电源和工艺腔室之间的阻抗给搭配合适,让功率能痛痛快快地输进去。它不显眼,但在产线上少它还真不行。东西靠谱,匹配快,不闹脾气,这就是它最大的本事。
Those who work in semiconductors know that the RF matching box may not look impressive, but if it cannot be adjusted properly, the entire process parameters will be chaotic. The Koshuha MBA-010-H-2 RF matching box is specifically designed for this delicate task - matching the impedance between the RF power supply and the load together, allowing power to be honestly delivered into the chamber.
5 characteristics
Automatic matching, no need for human intervention: Built in automatic matching algorithm, adjusts in real-time according to changes in the load inside the chamber, without the need for manual twisting, saving time and effort.
Fast response speed: The matching time is short, and the impedance can be stabilized at the beginning of the process without affecting the consistency of the process.
Adapt to multiple process gases: Whether it is etching or deposition, it can stably match different gas types and pressure changes.
The heat dissipation design is in place: the internal structure takes into account the heat dissipation requirements, and long-term high-power operation is not easy to overheat and cause chain failure.
Interface standard, easy wiring: The RF input/output interface adopts universal specifications and can be smoothly connected to mainstream RF power supplies and chambers.
five parameters
Brand/Model: Koshuha/MBA-010-H-2
Product Type: Automatic RF Matching Box
Core function: Automatic matching of RF impedance
Applicable scenario: RF transmission system for semiconductor process equipment
Brand affiliation: Koshuha (a Japanese professional RF equipment brand)
5 application areas
Semiconductor Etch Equipment
Chemical Vapor Deposition (CVD) Equipment
Physical Vapor Deposition (PVD) equipment
Plasma cleaning equipment
Other semiconductor processes that require RF plasma excitation
ending
Simply put, Koshuha MBA-010-H-2 is a 'matchmaker' - matching the impedance between the RF power supply and the process chamber appropriately, allowing power to be input smoothly and efficiently. It's not conspicuous, but it's really not enough on the production line. Reliable, fast matching, and no temper tantrums are its greatest abilities.

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