Edwards A419-61-222高真空干式泵 PDF资料
说到半导体制造中的真空环境,那可是关乎每一片晶圆良率的命脉。Edwards A419-61-222高真空干式泵,就是这一环节里一个靠得住的“肺”——不声不响,却把抽真空这件事做得干净利落。
5个特点
无油运行,干净环保:不用油密封和润滑,抽气腔室干干净净,不会污染晶圆。
体积小巧,不占地:设计紧凑,可以直接塞在机台旁边或地板格栅里,省地方。
皮实耐用,不爱坏:Edwards的泵出了名的可靠,日常运行稳当,用不着老去修。
抗腐蚀能力不错:能扛得住半导体工艺里那些轻度腐蚀性气体,不娇气。
安静平稳,不吵人:运行时振动和噪音都控制得挺好,对厂房环境很友好。
5个参数
品牌/型号:Edwards A419-61-222(EPX TWIN 180L)
产品系列:EPX系列高真空干式泵
泵类型:干式真空泵(无油运行)
核心用途:半导体等精密制造领域的真空抽气
品牌归属:Edwards(英国品牌,现属Atlas Copco集团)
5个应用领域
半导体蚀刻(Etch)
化学气相沉积(CVD)
物理气相沉积(PVD)
晶圆搬运与负载锁定(Loadlock)
离子注入及其他清洁工艺
结尾
说白了,Edwards A419-61-222这台泵不是什么花哨的新产品,但它属于那种在产线上默默干活、不太让人操心的类型。对于半导体厂来说,稳定、干净、少故障,就是好泵。它或许不是最前沿的型号,但却是很多产线上靠得住的那个“老黄牛”。
Edwards A419-61-222高真空干式泵 英文介绍
When it comes to the vacuum environment in semiconductor manufacturing, it is the lifeline that affects the yield of every wafer. The Edwards A419-61-222 high vacuum dry pump is a reliable "lung" in this process - it does vacuum pumping cleanly without making a sound.
5 characteristics
Oil free operation, clean and environmentally friendly: no need for oil sealing and lubrication, the suction chamber is clean and will not contaminate the wafer.
Compact size, no footprint: The design is compact and can be directly stuffed next to the machine or in the floor grille, saving space.
Durable and sturdy, not prone to breakage: Edwards' pumps are renowned for their reliability and stable daily operation, eliminating the need for constant repairs.
Good corrosion resistance: able to withstand mild corrosive gases in semiconductor processes without being delicate.
Quiet and stable, not noisy: The vibration and noise are well controlled during operation, which is very friendly to the factory environment.
five parameters
Brand/Model: Edwards A419-61-222 (EPX TWIN 180L)
Product series: EPX series high vacuum dry pump
Pump type: Dry vacuum pump (oil-free operation)
Core application: Vacuum pumping in precision manufacturing fields such as semiconductors
Brand affiliation: Edwards (a British brand, now part of Atlas Copco Group)
5 application areas
Semiconductor Etching (Etch)
Chemical Vapor Deposition (CVD)
Physical Vapor Deposition (PVD)
Wafer handling and load locking
Ion implantation and other cleaning processes
ending
To put it simply, the Edwards A419-61-222 pump is not a fancy new product, but it belongs to the type that works silently on the production line and is not too troublesome. For semiconductor factories, stability, cleanliness, and minimal malfunctions are good pumps. It may not be the most cutting-edge model, but it is the reliable "old cow" on many production lines.
Edwards A419-61-222高真空干式泵 产品图片

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