LAM 853-172610-003输出射频匹配模块 PDF资料
聊到LAM 853-172610-003这个输出射频匹配模块，它是LAM刻蚀或沉积设备上负责射频阻抗匹配和能量分配的核心部件。
特点
支持多路输出，可在多腔室间分配和平衡射频功率。
内部集成可调谐电容，支持独立调节特定参数。
响应速度快，能快速适应气体切换等工艺扰动。
能在高功率、强腐蚀性气体和高真空环境下稳定运行。
与LAM主流刻蚀平台深度集成，兼容性较好。
参数
货号：LAM Research 853-172610-003。
产品形态：多输出射频匹配模块。
支持频率：2MHz、13.56MHz、27MHz、60MHz等多频段。
功率容量：通常支持1kW至5kW以上连续波输出。
调谐方式：步进电机或伺服机构驱动可变电容器。
用途
LAM 2300、Kiyo、Exelan等系列刻蚀设备的射频匹配系统。
3D NAND和先进逻辑芯片制造中的等离子体工艺。
CVD和PECVD沉积工艺的射频能量耦合。
多腔室系统中维持不同工位间的射频参数一致性。
老旧LAM设备的射频匹配器维保替换。
总的来说，853-172610-003是LAM射频子系统中的关键模块，负责阻抗匹配和能量分配，直接关系到等离子体稳定性和工艺一致性。
LAM 853-172610-003输出射频匹配模块 英文介绍
When it comes to the LAM 853-172610-003 output RF matching module, it is the core component responsible for RF impedance matching and energy distribution on LAM etching or deposition equipment.
Characteristics
Supports multiple outputs and can distribute and balance RF power between multiple chambers.
Internally integrated tunable capacitors support independent adjustment of specific parameters.
Fast response speed, able to quickly adapt to process disturbances such as gas switching.
Capable of stable operation in high-power, highly corrosive gas, and high vacuum environments.
Deeply integrated with mainstream LAM etching platforms, with good compatibility.
parameter
Item number: LAM Research 853-172610-003.
Product form: Multi output RF matching module.
Supporting frequencies: 2MHz, 13.56MHz, 27MHz, 60MHz and other multiple frequency bands.
Power capacity: typically supports continuous wave output of 1kW to 5kW or more.
Tuning method: Stepper motor or servo mechanism drives variable capacitor.
Purpose
RF matching system for LAM 2300, Kiyo, Exelan and other etching equipment series.
Plasma technology in 3D NAND and advanced logic chip manufacturing.
RF energy coupling in CVD and PECVD deposition processes.
Maintain consistency of RF parameters between different workstations in a multi chamber system.
Maintenance and replacement of RF matching equipment for old LAM devices.
Overall, 853-172610-003 is a key module in the LAM RF subsystem, responsible for impedance matching and energy distribution, directly related to plasma stability and process consistency.
LAM 853-172610-003输出射频匹配模块 产品图片
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