MKS 3Z80-000036-V3射频发生器 PDF资料

1.产 品 资 料 介 绍：

聊到MKS 3Z80-000036-V3这个射频发生器，它是MKS Instruments为半导体等离子体工艺打造的射频功率源，在刻蚀和沉积工艺中负责提供稳定的高频能量。

特点

1. 属于MKS射频电源产品线，专为半导体等离子体工艺设计，输出稳定可靠。

2. 支持精确的功率和频率控制，能满足刻蚀、沉积等工艺对射频能量的严格要求。

3. 内置完善的保护机制，包括过载、过热、反射功率保护等，保障设备安全运行。

4. 与MKS配套的射频匹配器协同工作，可实现高效的射频能量传输。

5. 采用模块化设计，便于系统集成和日常维护。

参数

1. 货号：MKS 3Z80-000036-V3。

2. 产品形态：射频发生器（RF Generator）。

3. 输出功率与频率：具体规格需查阅原厂手册确认。

4. 适配系统：主要配套半导体刻蚀、PECVD、PVD等工艺机台。

5. 供应状态：常见为原厂新品或经测试的翻新备件。

用途

1. 半导体刻蚀工艺的等离子体激发。

2. PECVD和PVD等沉积工艺的射频供能。

3. 晶圆清洗和去胶工艺中的等离子体源。

4. 半导体制造设备中射频功率系统的配套。

5. 需要高频等离子体激励的各类工业应用。

总的来说，3Z80-000036-V3是MKS Instruments为半导体等离子体工艺开发的射频发生器，在稳定性和工艺适配性方面表现不错，常见于各类刻蚀和沉积机台的射频链路中

MKS 3Z80-000036-V3射频发生器  英文介绍

Talking about the MKS 3Z80-000036-V3 RF generator, it is an RF power source created by MKS Instruments for semiconductor plasma processes, responsible for providing stable high-frequency energy in etching and deposition processes.

Characteristics

Belonging to the MKS RF power supply product line, specifically designed for semiconductor plasma processes, with stable and reliable output.

Supports precise power and frequency control, meeting the strict requirements for RF energy in processes such as etching and deposition.

Built in comprehensive protection mechanisms, including overload, overheating, reflected power protection, etc., ensure the safe operation of the equipment.

The RF matching device that works in conjunction with MKS can achieve efficient RF energy transmission.

Adopting modular design for easy system integration and daily maintenance.

parameter

Item number: MKS 3Z80-000036-V3.

Product form: RF Generator.

Output power and frequency: Specific specifications need to be confirmed in the original factory manual.

Adaptation system: mainly equipped with semiconductor etching, PECVD, PVD and other process machines.

Supply status: Commonly seen as original new products or refurbished spare parts that have been tested.

Purpose

Plasma excitation in semiconductor etching process.

RF power supply for deposition processes such as PECVD and PVD.

Plasma source in wafer cleaning and debonding processes.

The matching of RF power system in semiconductor manufacturing equipment.

Various industrial applications that require high-frequency plasma excitation.

Overall, 3Z80-000036-V3 is an RF generator developed by MKS Instruments for semiconductor plasma processes, which performs well in stability and process adaptability. It is commonly used in RF links of various etching and deposition machines

MKS 3Z80-000036-V3射频发生器 产品图片

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型号：MKS 3Z80-000036-V3射频发生器

质保：一年

成色：全新/二手

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