Verity SD2048GL高分辨率光谱仪 PDF资料
Verity SD2048GL高分辨率光谱仪：半导体工艺终点检测的“火眼金睛”
在半导体干法刻蚀、离子束刻蚀这些工艺里，终点检测决定了晶圆的良率高低。Verity这款SD2048GL光谱仪，干的就是这个精细活——实时监控工艺腔体的光发射信号，精准判断刻蚀什么时候该停。Verity在半导体终点检测领域是行业标杆，这东西靠谱、精准、不添乱。
五个核心特点：
1、高分辨率，0.78到1纳米典型分辨率，比同系列0.5纳米分辨率的型号精细一倍，能看到更细微的光谱变化。
2、专为高分辨率终点检测设计，配合2048像素的CCD传感器，光谱数据以0.25纳米为间隔输出，判断刻蚀终点更准。
3、窄狭缝设计（10微米），高分辨率的同时需要配更强光源配合使用，灵敏度相对较低，这是高分辨的代价。
4、适配半导体主流接口，支持USB、RS232、以太网，集成到产线控制系统里不费劲。
5、AMAT设备配套件，常见于Applied Materials的刻蚀设备里，配套号0190-47081，装上去就能用，稳定可靠。
五个关键参数：
1、波长范围200到800纳米，覆盖紫外到可见光波段。
2、光谱分辨率0.8到1纳米，典型值0.78纳米。
3、10微米狭缝宽度，10微米进口狭缝。
4、传感器2048像素CCD。
5、工作温度0到40摄氏度，重量约2.5到3公斤。
五个典型应用：
1、半导体干法刻蚀工艺的终点检测。
2、离子束刻蚀工艺实时监控。
3、等离子体刻蚀中的光发射光谱监测。
4、灰化工艺的刻蚀终点判断。
5、AMAT半导体设备的配套终点检测系统。
Verity这款SD2048GL，分辨率高、响应快、在半导体产线里经过了长时间考验。对于需要精确定刻蚀终点的工艺来说，它是让人放心靠得住的选择
Verity SD2048GL high-resolution spectrometer: the "golden eye" for endpoint detection in semiconductor processes
In processes such as semiconductor dry etching and ion beam etching, endpoint detection determines the yield of wafers. The Verity SD2048GL spectrometer is designed for this precise task - monitoring the light emission signal of the process chamber in real-time and accurately determining when etching should stop. Verity is the industry benchmark in the field of semiconductor endpoint detection, which is reliable, accurate, and does not add to the chaos.
Five core characteristics:
1. High resolution, with a typical resolution of 0.78 to 1 nanometer, twice as fine as models in the same series with a resolution of 0.5 nanometers, allowing for more subtle spectral changes to be observed.
2. Specially designed for high-resolution endpoint detection, coupled with a 2048 pixel CCD sensor, spectral data is output at intervals of 0.25 nanometers to accurately determine the etching endpoint.
3. Narrow slit design (10 microns) requires a stronger light source to be used in conjunction with high resolution, resulting in relatively low sensitivity, which is the cost of high resolution.
4. Compatible with mainstream semiconductor interfaces, supports USB, RS232, Ethernet, and can be easily integrated into production line control systems.
5. AMAT equipment kit, commonly found in Applied Materials' etching equipment, kit number 0190-47081, can be used immediately after installation, stable and reliable.
Five key parameters:
1. The wavelength range is 200 to 800 nanometers, covering the ultraviolet to visible light spectrum.
2. The spectral resolution ranges from 0.8 to 1 nanometer, with a typical value of 0.78 nanometers.
3. 10 micron slit width, 10 micron inlet slit.
4. Sensor 2048 pixel CCD.
5. The working temperature ranges from 0 to 40 degrees Celsius, and the weight is approximately 2.5 to 3 kilograms.
Five typical applications:
1. Endpoint detection of semiconductor dry etching process.
2. Real time monitoring of ion beam etching process.
3. Optical emission spectroscopy monitoring in plasma etching.
4. Determination of etching endpoint for ashing process.
5. End point detection system for AMAT semiconductor equipment.
The Verity SD2048GL has high resolution, fast response, and has been tested for a long time in semiconductor production lines. For processes that require precise determination of the etching endpoint, it is a reassuring and reliable choice
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| S32HNNA-HGVM-00 | SC726A-001-PM72009 | SCE904-002-01 A |
| S32HMAA-HNNM-03 | SC453-016-02 | SC904AN-046-01 |
| S32GNNA-RNNM-00 | SC453-004-15 | SCE906-001-01 |
| S32GNNA-RNNE-00 | SC453-804-05 | SCE904-001-01 |
| S32GNNA-HGNM-00 | SC452-815-05 | SC9020010104G108 |
| S32GNAA-RNVE-00 | SC453-040-08 | SC900-001-01 |
| S32GMNA-RNNM-00 | SC722A-001-PM72008 | SCE905-001-00 |
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