AE 3155053-003射频发生器 PDF资料
AE 3155053-003（RFG 2000-2V）射频发生器：2千瓦的射频能量，稳定、皮实
搞半导体刻蚀或PVD镀膜的朋友，对AE的射频发生器肯定不会陌生。这款3155053-003，型号是RFG 2000-2V，是AE专门为等离子体工艺打造的2千瓦射频电源。在需要稳定射频能量输出的场合，它是非常靠谱的选择，业内口碑相当不错。
五个核心特点：
1、功率够大，2千瓦的输出能力，能轻松应对半导体刻蚀、PVD镀膜这类大负载工艺。
2、双路输出设计，可以同时给多个负载供电，互不干扰，效率高。
3、输出稳定，电压纹波和噪声都很低，对敏感工艺很友好。
4、控制方式灵活，支持前面板操作，也支持RS-232或USB远程控制，方便集成到自动化产线里。
5、皮实耐造，采用加固元件设计，能扛住温度波动和电气干扰，适合工业环境长期运行。
五个关键参数：
1、输出功率2千瓦。
2、电压范围0到2000伏直流。
3、总谐波失真小于1%，输出电很干净。
4、负载响应时间1.5微秒，反应快。
5、重量约20公斤，适合集成到19英寸机柜中。
五个典型应用：
1、半导体制造中的等离子体刻蚀。
2、PVD物理气相沉积（溅射镀膜）的射频电源。
3、等离子体清洗和表面处理工艺。
4、平板显示器和太阳能电池的生产镀膜。
5、大学和科研机构的等离子体实验平台。
AE这款RFG 2000-2V，3155053-003，是真正干“重活”的选手，双路输出、稳定皮实。对于那些需要长时间稳定运行的大功率射频工艺来说，它绝对是个让人放心的选择。
AE 3155053-003射频发生器 英文介绍
AE 3155053-003 (RFG 2000-2V) RF Generator: 2 kW of RF energy, stable and robust
Friends who are engaged in semiconductor etching or PVD coating are definitely familiar with AE RF generators. This 3155053-003, model RFG 2000-2V, is a 2-kW RF power supply specially designed by AE for plasma processes. In situations where stable RF energy output is required, it is a very reliable choice and has a good reputation in the industry.
Five core characteristics:
1. The power is large enough, with an output capacity of 2 kilowatts, to easily handle high load processes such as semiconductor etching and PVD coating.
2. Dual output design, capable of supplying power to multiple loads simultaneously without interfering with each other, with high efficiency.
3. Stable output, low voltage ripple and noise, and friendly to sensitive processes.
4. Flexible control mode, supports front panel operation, and also supports RS-232 or USB remote control, making it easy to integrate into automated production lines.
5. Durable and sturdy, designed with reinforced components, capable of withstanding temperature fluctuations and electrical interference, suitable for long-term operation in industrial environments.
Five key parameters:
1. Output power of 2 kilowatts.
2. The voltage range is 0 to 2000 volts DC.
3. The total harmonic distortion is less than 1%, and the output power is very clean.
4. The load response time is 1.5 microseconds, and the response is fast.
5. Weighing approximately 20 kilograms, it is suitable for integration into a 19 inch cabinet.
Five typical applications:
1. Plasma etching in semiconductor manufacturing.
2. RF power supply for PVD physical vapor deposition (sputtering coating).
3. Plasma cleaning and surface treatment processes.
4. Production and coating of flat panel displays and solar cells.
5. Plasma experimental platforms for universities and research institutions.
The AE RFG 2000-2V, 3155053-003, is a true contender for "heavy work" with dual output and stable performance. For high-power RF processes that require long-term stable operation, it is definitely a reassuring choice.
AE 3155053-003射频发生器 产品图片
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