AMAT 0190-30906干式泵 PDF资料

1.产 品 资 料 介 绍：

AMAT 0190-30906干式泵是一款由丰田生产、应用材料认证使用的干式真空泵，型号为IPUP T100L，在半导体制造等严苛工业环境中得到广泛应用。

产品特点

1. 采用无油干式设计，有效避免油蒸气污染，保障工艺腔体的洁净度

2. 能够实现高真空度抽气效果，保证气体纯度与质量

3. 设计简洁，易于维护保养，降低使用成本和维护难度

4. 采用高品质材料与精密工艺制造，具备高可靠性和长期运行稳定性

5. 提供多种接口和连接方式，便于与半导体设备系统集成

产品参数

1. 部件号：0190-30906

2. 型号：IPUP T100L V3.4

3. 制造商：丰田

4. 认证：应用材料认证使用

5. 产地：日本

应用领域

1. 半导体制造工艺中的真空环境维持

2. 应用材料各类设备的配套抽气系统

3. 刻蚀、沉积等工艺腔体的真空获取

4. 晶圆传输系统中的真空搬运与定位

5. 需要无油、洁净高真空环境的工业应用

总而言之，AMAT 0190-30906干式泵作为经应用材料认证的丰田IPUP T100L干式真空泵，凭借无油设计和稳定可靠的性能，在半导体制造的真空系统中扮演着重要角色。这款0190-30906干式泵在刻蚀、沉积等关键工艺设备的真空获取与维持中，是值得信赖的配套组件。

AMAT 0190-30906干式泵  英文介绍

No need for the same answer

AMAT 0190-30906 dry pump is a dry vacuum pump under the application material certification system, manufactured by Toyota Industries' vacuum pump department and widely used in semiconductor front-end process equipment.

Product Features

Completely oil-free compression chamber design, eliminating hydrocarbon pollution, suitable for high cleanliness processes

Adopting a multi-stage Roots and claw type combination structure, the pumping speed curve is gentle and performs well from atmospheric pressure to high vacuum

Built in temperature compensation control to prevent process gas from condensing or by-products from accumulating inside the pump

The sealing element is made of corrosion-resistant perfluororubber, compatible with corrosive process gases such as halogens

Equipped with an exhaust purge interface, it can dilute or neutralize harmful exhaust gases, extending the lifespan of the pump body

Product Specifications

Part number: 0190-30906

Corresponding model: Toyota IPUP T100L series

Inlet flange: ISO-K or NW type, compatible with mainstream semiconductor cavity interfaces

Cooling method: Water cooling or air cooling is optional, suitable for different machine heat dissipation conditions

Control interface: supports remote start/stop and status monitoring

Application Areas

Vacuum pumping system for dry etching equipment such as dielectric etching and metal etching

Exhaust of reaction chambers in chemical vapor deposition equipment such as PECVD and HDP-CVD

Vacuum maintenance of beam pipeline in ion implantation equipment

Background vacuum extraction during physical vapor deposition (PVD) coating process

Integrated matching options for mainstream machines such as AMAT Centura and Endura

In summary, the AMAT 0190-30906 dry pump provides a clean and stable vacuum environment for semiconductor core processes through its oil-free structure and corrosion-resistant design. As a supporting component certified by AMAT, this 0190-30906 exhibits good gas compatibility and long-term reliability in practical applications of etching and deposition chambers

AMAT 0190-30906干式泵 产品图片

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型号：AMAT 0190-30906干式泵

质保：一年

成色：全新/二手

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