Novellus 27-033321-00 涡轮分子泵 PDF资料
Novellus 27-033321-00 涡轮分子泵
该型号为Novellus半导体设备中使用的涡轮分子泵，实际由Osaka Vacuum制造，型号为TG1133EMBW-07。
产品特点
高真空性能：采用多级涡轮叶片设计，可实现高压缩比，为半导体工艺腔室提供稳定的高真空环境。
无油洁净运行：磁悬浮轴承或干式润滑设计，避免油蒸汽污染，满足半导体工艺对洁净度的严苛要求。
快速抽气能力：具备高抽速和快速启动特性，有效缩短工艺准备时间，提升产线效率。
抗腐蚀设计：内部流道和转子采用特殊涂层或耐腐蚀材料，能够耐受CVD和刻蚀工艺中的腐蚀性气体。
运行稳定可靠：内置振动抑制和温度补偿技术，确保持续运行时的稳定性，降低维护频率。
关键信息
品牌：Novellus / 实际制造商：Osaka Vacuum。
Novellus部件号：27-033321-00。
对应Osaka型号：TG1133EMBW-07。
配套设备：Novellus Concept 2 Sequel、Gamma Express等CVD及刻蚀设备。
产地：日本。
应用领域
化学气相沉积（CVD）工艺的真空系统配套。
半导体刻蚀（Etch）设备的腔体真空维持。
Novellus Sequel系列沉积反应器的真空环境控制。
金属沉积、氧化物和氮化物薄膜工艺的真空供应。
半导体设备维护升级中的泵组替换与配套。
简而言之，Novellus 27-033321-00是Novellus半导体设备中采用、Osaka Vacuum制造的涡轮分子泵，用于CVD和刻蚀等工艺的真空系统，以高真空性能和无油洁净运行为核心特点，是保障工艺腔室高真空环境的关键部件
Novellus 27-033321-00 涡轮分子泵 英文介绍
Novellus 27-033321-00 Turbomolecular Pump
This model is a turbo molecular pump used in Novellus semiconductor equipment, actually manufactured by Osaka Vacuum, with the model number TG1133EMBW-07.
Product Features
High vacuum performance: Adopting a multi-stage turbine blade design, it can achieve high compression ratio and provide a stable high vacuum environment for semiconductor process chambers.
Oil free clean operation: Magnetic levitation bearings or dry lubrication design to avoid oil vapor pollution and meet the strict cleanliness requirements of semiconductor processes.
Rapid pumping capability: With high pumping speed and fast start-up characteristics, it effectively shortens process preparation time and improves production line efficiency.
Corrosion resistant design: The internal flow channels and rotors are coated with special materials or corrosion-resistant materials that can withstand corrosive gases in CVD and etching processes.
Stable and reliable operation: Built in vibration suppression and temperature compensation technology ensures stability during continuous operation and reduces maintenance frequency.
Key information
Brand: Novellus/Actual manufacturer: Osaka Vacuum.
Novellus part number: 27-033321-00.
Corresponding Osaka model: TG1133EMBW-07.
Supporting equipment: Novellus Concept 2 Sequel, Gamma Express and other CVD and etching equipment.
Origin: Japan.
Application areas
Vacuum system matching for chemical vapor deposition (CVD) process.
The cavity vacuum of semiconductor etching (Etch) equipment is maintained.
Vacuum environment control of Novellus Sequel series sedimentation reactors.
Vacuum supply for metal deposition, oxide and nitride thin film processes.
Replacement and matching of pump units in semiconductor equipment maintenance and upgrading.
In short, Novellus 27-033321-00 is a turbomolecular pump used in Novellus semiconductor equipment and manufactured by Osaka Vacuum. It is used in vacuum systems for processes such as CVD and etching, with high vacuum performance and oil-free clean operation as its core characteristics. It is a key component to ensure a high vacuum environment in the process chamber
Novellus 27-033321-00 涡轮分子泵 产品图片
3.其他产品
CI854K01 3BSE025961R1 控制器模块
KOLLMORGEN 60WKS-CE240 22PB 伺服驱动器
REXROTH VT-MACAS-500-10/V0/I 比例放大板
4.其他产品
3BHE024415R0101 GVC714A101 IGCT Card
BENTLY 136188-02 Displacement monitor
PILZ 301140 memory
| 6415-001-N-N-N | 6DD1681-0BD1 | TRICONEX 3700A |
| 6415-001-N-N-K | 6DD1681-0AJ2 | TRICONEX 3701 |
| 6415-001-N-H-K | 6DD1681-0AJ1 | TRICONEX 3703E |
| 6415-001-G-N-K | 6DD1681-0AJ0 | TRICONEX 3604E |
| 6415-001-C-N-N | 6DD1681-0AH2 | TRICONEX 3636R |
| 6415-001-C-N-K | 6DD1681-0AH1 | TRICONEX 3501E |
本篇文章出自瑞昌明盛自动化设备有限公司官网，转载请附上此链接:https://www.jiangxidcs.com
