MKS FI20620-1 远程等离子源 PDF资料
1.产 品 资 料 介 绍:
MKS FI20620-1 远程等离子源(RPS)是 MKS ASTRON 2L 系列中的一款射频等离子电源。该产品采用远程等离子体源(RPS)设计,将等离子体生成区与工艺腔分离,有效避免电极污染与金属溅射,专为半导体晶圆制造中的高精度、高通量处理工艺而开发。
一、产品应用领域(10条)
半导体晶圆刻蚀工艺
半导体化学气相沉积(CVD)
半导体物理气相沉积(PVD)
半导体晶圆干法清洗
光刻胶去除(去胶工艺)
晶圆表面活化处理
半导体 ALD/ALE 腔室清洁
平板显示器(FPD)面板制造
LED 芯片制造
光伏电池板制造
二、核心产品参数(5条)
产品系列:MKS ASTRON 2L 系列远程等离子源
产品型号:FI20620-1
适用设备:AMAT(Applied Materials)半导体设备
合规认证:CE 标志
产品状态:该型号为已停产产品
结尾: 综上所述,MKS FI20620-1(ASTRON 2L 系列 RPS 远程等离子源)作为半导体晶圆处理领域的等离子源设备,为刻蚀、沉积、清洗等关键工艺提供了可靠的等离子体环境。鉴于该型号已停产,实际采购中建议着重验证其实际工作状态与等离子输出性能。
MKS FI20620-1 远程等离子源 英文介绍
The MKS FI20620-1 Remote Plasma Source (RPS) is a radio frequency plasma power supply in the MKS ASTRON 2L series. This product adopts a remote plasma source (RPS) design, which separates the plasma generation area from the process chamber, effectively avoiding electrode contamination and metal sputtering. It is specially developed for high-precision and high-throughput processing in semiconductor wafer manufacturing.
1、 Product application areas (10 items)
Semiconductor wafer etching process
Semiconductor Chemical Vapor Deposition (CVD)
Semiconductor Physical Vapor Deposition (PVD)
Dry cleaning of semiconductor wafers
Photoresist removal (photoresist removal process)
Wafer surface activation treatment
Cleaning of semiconductor ALD/ALE chamber
Flat Panel Display (FPD) Panel Manufacturing
LED chip manufacturing
Manufacturing of photovoltaic panels
2、 Core product parameters (5 items)
Product series: MKS ASTRON 2L series remote plasma source
Product model: FI20620-1
Applicable equipment: AMAT (Applied Materials) semiconductor equipment
Compliance certification: CE mark
Product status: This model is a discontinued product
Conclusion: In summary, MKS FI2062-1 (ASTRON 2L series RPS remote plasma source), as a plasma source equipment in the field of semiconductor wafer processing, provides a reliable plasma environment for key processes such as etching, deposition, and cleaning. Considering that this model has been discontinued, it is recommended to focus on verifying its actual working condition and plasma output performance during actual procurement.
MKS FI20620-1 远程等离子源 产品图片

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