MKS AX7685-20 远程等离子体源 PDF资料
1.产 品 资 料 介 绍：
MKS AX7685-20 远程等离子体源 产品简介
MKS AX7685-20 是 MKS Instruments 旗下 ASTRONex 系列的一款反应气体发生器，采用专利低场环形等离子体技术，用于高效解离输入气体以产生下游活性反应物，主要应用于 CVD 腔室清洁等工艺。
产品特点
采用 MKS 专利低场环形等离子体技术，气体解离效率高。
支持 NF₃、C₃F₈、CF₄ 等多种气体，无需氩气辅助运行。
额定 NF₃ 流量可达 6 slm，典型解离率 > 95%。
支持连续运行模式（CW），不受占空比限制。
集成电源、控制模块与等离子体室于一体，结构紧凑。
工作压力范围 1-10 Torr，适配多种工艺条件。
内部材料采用硬质阳极氧化铝及氧化铝陶瓷，耐腐蚀性强。
配备 9 针和 25 针 D 型连接器，便于系统集成。
通过 CE、NRTL 及 SEMI F47 认证，符合行业安全标准。
归属于 AMAT 原厂备件体系，AMAT 备件号为 0190-34542。
产品参数
型号：AX7685-20 / ASTRONex。
制造商：MKS Instruments。
输入电源：187-228VAC，50/60Hz，三相，60A。
冷却方式：水冷，流量 2.0 gpm，水温 < 30°C。
重量：74 lb（约 33.5 kg）。
综上所述，MKS AX7685-20 凭借其高效的等离子体解离能力、最高 6 slm 的活性气体输出及紧凑的集成设计，是半导体 CVD 腔室清洁等工艺中高效、可靠的远程等离子体源解决方案。
Introduction to MKS AX7685-200 Remote Plasma Source Product
The MKS AX7685-20 is a reactive gas generator from the ASTRONex series under MKS Instruments. It uses patented low field annular plasma technology to efficiently dissociate input gases to generate downstream active reactants. It is mainly used in processes such as CVD chamber cleaning.
Product Features
Adopting MKS patented low field annular plasma technology, the gas dissociation efficiency is high.
Supports various gases such as NF ∝, C ∝ F ₈, CF ₄, etc., without the need for argon gas assistance for operation.
The rated NF ∝ flow rate can reach 6 slm, with a typical dissociation rate>95%.
Support continuous operation mode (CW), not limited by duty cycle.
Integrated power supply, control module, and plasma chamber, with a compact structure.
The working pressure range is 1-10 Torr, suitable for various process conditions.
The internal materials are made of hard anodized aluminum and aluminum oxide ceramics, which have strong corrosion resistance.
Equipped with 9-pin and 25 pin D-type connectors for easy system integration.
Certified by CE, NRTL, and SEMI F47, in compliance with industry safety standards.
Belonging to the AMAT original spare parts system, the AMAT spare part number is 0190-34542.
Product Parameters
Model: AX7685-200/ASTRONex.
Manufacturer: MKS Instruments.
Input power supply: 187-228VAC, 50/60Hz, three-phase, 60A.
Cooling method: Water cooling, flow rate 2.0 gpm, water temperature<30 ° C.
Weight: 74 lb (approximately 33.5 kg).
In summary, the MKS AX7685-200 is an efficient and reliable remote plasma source solution for semiconductor CVD chamber cleaning and other processes, thanks to its efficient plasma dissociation capability, maximum active gas output of 6 slm, and compact integrated design.
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