AMAT 0190-15553 控制器模块 PDF资料
1.产 品 资 料 介 绍：
AMAT 0190-15553 控制器模块 产品简介
AMAT 0190-15553 是 Applied Materials 的一款射频发生器，由 Advanced Energy 制造，对应型号 HFV 8000，为半导体蚀刻、沉积等工艺提供稳定的射频能量。
产品特点
输出功率涵盖 3kW、5kW、8kW 多个档位。
输出频率范围 1.765 至 2.165 MHz。
采用数字合成变频输出技术。
搭载微处理器控制系统，支持频率调谐参数定制。
支持中心频率模式和自动调谐模式两种运行方式。
配备 15 针模拟端口和串行通信端口（兼容 RS-232、RS-422、RS-485）。
采用水冷散热设计，适合长时间连续运行。
结构紧凑，采用 19 英寸机架安装式外壳。
采用 Advanced Energy 专利射频电路拓扑。
适用于 200/300mm 晶圆制程中的 IPVD、CVD 及蚀刻等工艺。
产品参数
型号：0190-15553 / HFV 8000。
制造商：Advanced Energy。
AMAT 备件号：0190-15553。
输出频率：1.765 - 2.165 MHz。
AC 电源输入：3-phase, 400-480VAC, 50/60Hz。
综上所述，AMAT 0190-15553 凭借其多档功率输出和先进的变频技术，能够为半导体制造中的等离子体工艺提供稳定可靠的射频能量源。
AMAT 0190-15553 Controller Module Product Introduction
AMAT 0190-15553 is an RF generator from Applied Materials, manufactured by Advanced Energy and corresponding to model HFV 8000. It provides stable RF energy for semiconductor etching, deposition, and other processes.
Product Features
The output power covers multiple levels including 3kW, 5kW, and 8kW.
The output frequency range is 1.765 to 2.165 MHz.
Adopting digital synthesis frequency conversion output technology.
Equipped with a microprocessor control system, supporting frequency tuning parameter customization.
Supports two operating modes: center frequency mode and automatic tuning mode.
Equipped with a 15 pin analog port and a serial communication port (compatible with RS-232, RS-422, RS-485).
Adopting water-cooled heat dissipation design, suitable for long-term continuous operation.
Compact structure, using a 19 inch rack mounted housing.
Adopting Advanced Energy's patented RF circuit topology.
Suitable for IPVD, CVD, and etching processes in 200/300mm wafer manufacturing processes.
Product Parameters
Model: 0190-15553/HFV 8000.
Manufacturer: Advanced Energy.
AMAT spare part number: 0190-15553.
Output frequency: 1.765-2.165 MHz.
AC power input: 3-phase, 400-480VAC, 50/60Hz.
In summary, AMAT 0190-15553, with its multi level power output and advanced frequency conversion technology, can provide a stable and reliable RF energy source for plasma processes in semiconductor manufacturing.
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