Edwards ACDA0A122200 真空泵 PDF资料
1.产 品 资 料 介 绍：
Edwards ACDA0A122200 干式真空泵
该型号对应 Edwards iXH 1210H HARSH 系列干式真空泵，采用多级罗茨设计，专为半导体行业中涉及严苛化学工艺的绿色制造场景打造。
产品特点
专为严苛化学工艺设计，气体阻隔技术与热设计改进使其耐腐蚀性能相比前代产品提升四倍。
高效罗茨机构将输入功率大幅降至 1.3 kW，比上一代干泵降低 60%，有效减少环境影响与使用成本。
配备多模式 44 slm 气体模块与不锈钢水冷系统，支持 3/8 英寸快速连接注水接口。
紧凑轻量化设计，噪音和振动极低，无需预防性维护，适合长期连续运行。
广泛适用于负载锁、传输、蚀刻、PVD、CVD、RTP 等半导体制造工艺。
核心参数
峰值抽速：1025 m³/h（603 CFM）。
极限压力：5.0 × 10⁻³ Torr。
电源：三相 200-230 VAC，50/60 Hz。
部件编号：AC3A0A122200。
总结
Edwards ACDA0A122200（iXH 1210H HARSH）是一款面向半导体严苛制程的高性能干式真空泵，以大幅降低的能耗、优异的耐腐蚀性和紧凑设计为核心优势，为蚀刻、CVD 等对可靠性和洁净度要求极高的工艺场景提供了高效、经济的解决方案。
Edwards ACDA0A122200 Dry Vacuum Pump
This model corresponds to the Edwards iXH 1210H HARSH series dry vacuum pump, which adopts a multi-stage Roots design and is specially designed for green manufacturing scenarios involving harsh chemical processes in the semiconductor industry.
Product Features
Specially designed for rigorous chemical processes, gas barrier technology and thermal design improvements have increased its corrosion resistance performance by four times compared to previous generation products.
The high-efficiency Roots mechanism significantly reduces the input power to 1.3 kW, which is 60% lower than the previous generation dry pump, effectively reducing environmental impact and operating costs.
Equipped with multi-mode 44 SLM gas module and stainless steel water cooling system, supporting 3/8-inch quick connection water injection interface.
Compact and lightweight design, extremely low noise and vibration, no need for preventive maintenance, suitable for long-term continuous operation.
Widely applicable to semiconductor manufacturing processes such as load locking, transmission, etching, PVD, CVD, RTP, etc.
Core parameters
Peak pumping speed: 1025 m ³/h (603 CFM).
Ultimate pressure: 5.0 × 10 ⁻ ³ Torr.
Power supply: Three phase 200-230 VAC, 50/60 Hz.
Part number: AC3A0A122200.
Summary
Edwards ACDA0A122200 (iXH 1210H HARSH) is a high-performance dry vacuum pump designed for semiconductor demanding processes. With significantly reduced energy consumption, excellent corrosion resistance, and compact design as its core advantages, it provides an efficient and economical solution for processes such as etching and CVD that require high reliability and cleanliness.
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