Huttinger  C40-0647 D40-647.1射频控制单元 PDF资料 

1.产 品 资 料 介 绍：

Huttinger C40-0647 / D40-647.1 射频控制单元

产品概述

Huttinger C40-0647 / D40-647.1 是一款 工业级射频控制单元（RF Control Unit），用于射频发电机、功率放大器及等离子系统中，实现射频功率的精准控制、信号处理和状态监控。该控制单元是工业射频和等离子设备中核心控制组件，保障系统稳定性和工艺精度。

• 型号：C40-0647 / D40-647.1

• 类型：射频控制单元（RF Control Unit）

• 功能：射频功率控制、信号处理、状态监控、模块管理

• 应用领域：半导体制造、PVD/CVD 薄膜工艺、等离子处理、科研实验

产品特点

1. 高精度射频控制

• 精确调节射频功率和波形，保证工艺稳定性和设备安全。

2. 快速响应

• 实时处理控制信号，满足高精度工业和科研需求。

3. 工业级可靠性

• 支持长期连续运行，耐高温、抗振动及电磁干扰能力强。

4. 完善保护功能

• 内置过流、过压、短路及过温保护，提高设备及系统安全性。

5. 模块化设计

• 易于安装、替换和维护，可与 Huttinger 系列射频和功率模块配套使用。

6. 灵活接口

• 支持本地面板操作和远程接口控制，可集成自动化系统，实现精密工艺管理。

应用领域

1. 半导体制造

• 等离子刻蚀、离子注入及薄膜沉积工艺的核心射频控制模块。

2. 薄膜沉积与表面处理

• PVD/CVD 工艺及光学镀膜设备的精密射频控制单元。

3. 科研实验

• 材料科学、等离子物理及高精度射频实验中的核心控制组件。

4. 工业制造

• 功能性薄膜加工、精密表面处理及连续生产工艺设备的射频控制核心。

英文资料：

Huttinger C40-0647/D40-647.1 RF control unit

Product Overview

Huttinger C40-0647/D40-647.1 is an industrial grade RF Control Unit used in RF generators, power amplifiers, and plasma systems to achieve precise control, signal processing, and status monitoring of RF power. This control unit is the core control component in industrial RF and plasma equipment, ensuring system stability and process accuracy.

Model: C40-0647/D40-647.1

Type: RF Control Unit

Function: RF power control, signal processing, status monitoring, module management

Application areas: semiconductor manufacturing, PVD/CVD thin film process, plasma treatment, scientific research experiments

Product Features

High precision RF control

Accurately adjust RF power and waveform to ensure process stability and equipment safety.

quick response

Real time processing of control signals to meet high-precision industrial and scientific research needs.

Industrial grade reliability

Supports long-term continuous operation, with strong resistance to high temperature, vibration, and electromagnetic interference.

Improve protection functions

Built in overcurrent, overvoltage, short circuit, and over temperature protection to improve equipment and system safety.

modular design

Easy to install, replace, and maintain, compatible with the Huttinger series RF and power modules.

Flexible interface

Supports local panel operation and remote interface control, can integrate automation systems, and achieve precision process management.

Application field

Semiconductor Manufacturing

The core RF control module for plasma etching, ion implantation, and thin film deposition processes.

Thin film deposition and surface treatment

Precision RF control unit for PVD/CVD process and optical coating equipment.

Scientific research experiment

Core control components in materials science, plasma physics, and high-precision RF experiments.

industrial manufacturing

RF control core for functional film processing, precision surface treatment, and continuous production process equipment.

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