Huttinger C40-0864-01 D40-864-0射频单元板 PDF资料
1.产 品 资 料 介 绍:
Huttinger C40-0864-01 / D40-0864-0 射频单元板
产品概述
Huttinger C40-0864-01 / D40-0864-0 是一款 工业级射频单元板(RF Unit Board),用于射频发电机、功率放大器或等离子系统中的射频信号调节和功率控制。该射频单元板能够精确控制射频输出功率和波形,确保激光或等离子工艺的稳定性与一致性,是高精度工业和科研应用中的核心模块。
型号:C40-0864-01 / D40-0864-0
类型:射频单元板(RF Unit Board)
功能:射频功率控制、信号调节、负载匹配
应用领域:半导体制造、激光加工、薄膜沉积及科研实验
产品特点
高精度射频输出
可对发电机或功率放大器输出的射频功率、电压和电流进行精密调节,确保工艺稳定。
负载匹配优化
与匹配网络协作,实现射频系统与负载的最佳阻抗匹配,降低反射功率,提高能量传输效率。
工业级可靠性
支持长时间连续运行,抗干扰能力强,适合复杂工业环境。
保护功能
内置过流、过压及短路保护,保障设备及工艺安全。
模块化设计
易于安装、维护和替换,可与 HUTTINGER 系列射频模块兼容。
控制灵活
支持本地面板操作和远程接口控制,便于集成自动化工艺系统。
应用领域
半导体制造
用于等离子刻蚀、离子注入及薄膜沉积等工艺的射频功率控制。
激光加工
激光切割、焊接、打标及精密加工中的射频功率调节。
薄膜沉积与表面处理
PVD/CVD 工艺、光学镀膜及工业涂层等高精度工艺。
科研实验
材料科学、等离子物理及高精度射频实验的核心控制模块。
英文资料:
Huttinger C40-0864-01/D40-0864-0 RF Unit Board
Product Overview
Huttinger C40-0864-01/D40-0864-0 is an industrial grade RF Unit Board used for RF signal conditioning and power control in RF generators, power amplifiers, or plasma systems. This RF unit board can accurately control the RF output power and waveform, ensuring the stability and consistency of laser or plasma processes, and is a core module in high-precision industrial and scientific research applications.
Model: C40-0864-01/D40-0864-0
Type: RF Unit Board
Function: RF power control, signal conditioning, load matching
Application areas: semiconductor manufacturing, laser processing, thin film deposition, and scientific research experiments
Product Features
High precision RF output
It can precisely adjust the RF power, voltage, and current output by the generator or power amplifier to ensure process stability.
Load matching optimization
Collaborate with matching networks to achieve optimal impedance matching between RF systems and loads, reduce reflected power, and improve energy transmission efficiency.
Industrial grade reliability
Supports long-term continuous operation, strong anti-interference ability, suitable for complex industrial environments.
protection function
Built in overcurrent, overvoltage, and short-circuit protection to ensure equipment and process safety.
modular design
Easy to install, maintain, and replace, compatible with HUTTINGER series RF modules.
Flexible control
Supports local panel operation and remote interface control, making it easy to integrate automated process systems.
Application field
Semiconductor Manufacturing
RF power control for processes such as plasma etching, ion implantation, and thin film deposition.
Laser processing
RF power regulation in laser cutting, welding, marking, and precision machining.
Thin film deposition and surface treatment
High precision processes such as PVD/CVD technology, optical coating, and industrial coating.
Scientific research experiment
The core control module for materials science, plasma physics, and high-precision RF experiments.
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