Huttinger   C40-0851.02射频板 PDF资料 

1.产 品 资 料 介 绍：

HUTTINGER C40-0851.02 射频板

产品概述

Huttinger C40-0851.02 是一款 工业级射频（RF）控制板，用于射频发电机、功率放大器或等离子系统中的射频信号调节与功率控制。该板可实现高精度射频输出控制、负载匹配优化及状态监控，是半导体制造、薄膜沉积及科研实验中的关键模块。

• 型号：C40-0851.02

• 类型：射频控制板（RF Control Board）

• 功能：射频信号调节、功率控制、负载匹配

• 应用领域：半导体制造、PVD/CVD 薄膜工艺、等离子处理及科研实验

产品特点

1. 高精度射频控制

• 可对发电机或功率放大器输出的射频功率、电压和电流进行精确调节，保证工艺稳定性。

2. 负载匹配优化

• 与匹配网络协同工作，实现射频系统与负载的最佳阻抗匹配，降低反射功率，提高能量传输效率。

3. 工业级可靠性

• 高稳定性设计，支持连续长时间运行，抗干扰能力强。

4. 保护功能

• 内置过流、过压及短路保护，提高系统安全性，防止模块或负载损坏。

5. 模块化设计

• 便于安装、替换和维护，可与 HUTTINGER 系列发电机、功率放大器及匹配网络兼容。

6. 远程与本地控制

• 支持本地操作面板和远程控制接口，便于集成到自动化工艺系统中。

应用领域

1. 半导体制造

• 等离子刻蚀、离子注入及薄膜沉积工艺的射频功率控制。

2. 薄膜沉积与表面处理

• PVD/CVD 工艺、光学镀膜及工业涂层等高精度工艺。

3. 科研实验

• 材料科学、等离子物理及高频射频实验中的核心控制模块。

4. 工业制造

• 精密表面处理、功能性薄膜加工及连续生产工艺的射频控制。

英文资料：

HUTTINGER C40-0851.02 RF board

Product Overview

Huttinger C40-0851.02 is an industrial grade RF control board used for RF signal conditioning and power control in RF generators, power amplifiers, or plasma systems. This board can achieve high-precision RF output control, load matching optimization, and status monitoring, and is a key module in semiconductor manufacturing, thin film deposition, and scientific research experiments.

Model: C40-0851.02

Type: RF Control Board

Function: RF signal regulation, power control, load matching

Application areas: semiconductor manufacturing, PVD/CVD thin film process, plasma treatment, and scientific research experiments

Product Features

High precision RF control

It can accurately adjust the RF power, voltage, and current output by the generator or power amplifier to ensure process stability.

Load matching optimization

Collaborate with the matching network to achieve optimal impedance matching between the RF system and the load, reduce reflected power, and improve energy transmission efficiency.

Industrial grade reliability

High stability design, supports continuous long-term operation, and has strong anti-interference ability.

protection function

Built in overcurrent, overvoltage, and short-circuit protection to enhance system safety and prevent module or load damage.

modular design

Easy to install, replace, and maintain, compatible with HUTTINGER series generators, power amplifiers, and matching networks.

Remote and local control

Supports local operation panel and remote control interface, making it easy to integrate into automated process systems.

Application field

Semiconductor Manufacturing

RF power control for plasma etching, ion implantation, and thin film deposition processes.

Thin film deposition and surface treatment

High precision processes such as PVD/CVD technology, optical coating, and industrial coating.

Scientific research experiment

The core control module in materials science, plasma physics, and high-frequency RF experiments.

industrial manufacturing

RF control for precision surface treatment, functional film processing, and continuous production processes.

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