Huttinger THE-911811电弧控制卡 PDF资料 

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HUTTINGER THE-911811 电弧控制卡

产品概述

Huttinger THE-911811 是一款专用于工业等离子或射频系统的 电弧控制卡，主要用于监测和控制等离子或高压直流发电模块中的电弧放电。该控制卡可提高工艺稳定性、保护设备安全，并在高精度工业工艺中发挥关键作用。

• 型号：THE-911811

• 类型：电弧控制卡（Arc Control Card）

• 功能：监测和控制电弧状态，保护电源模块及工艺设备

• 应用领域：半导体制造、溅射沉积、PVD/CVD 工艺、科研实验

产品特点

1. 电弧检测与保护

• 实时检测电弧发生情况，能够快速响应异常放电，防止设备损坏。

• 内置过流、过压保护功能，提高系统安全性。

2. 高精度控制

• 能够精确控制电弧触发和维持过程，保证等离子工艺的稳定性和重复性。

3. 兼容性强

• 可与 HUTTINGER 系列发电机、功率放大器及匹配网络配合使用，适应不同工艺需求。

4. 工业级可靠性

• 高稳定性设计，适合长时间连续运行的生产环境。

• 抗干扰能力强，适应射频和高压等工艺环境。

5. 模块化与易维护

• 模块化电路设计，便于快速更换和维护。

• 支持集成到自动化控制系统中，实现远程监控与控制。

6. 工艺优化支持

• 在电弧控制的同时，可协助优化工艺参数，提高薄膜沉积、蚀刻或表面处理的工艺质量。

英文资料：

HUTTINGER THE-911811 Arc Control Card

Product Overview

Huttinger THE-911811 is an arc control card specifically designed for industrial plasma or RF systems, primarily used for monitoring and controlling arc discharge in plasma or high-voltage DC power generation modules. This control card can improve process stability, protect equipment safety, and play a key role in high-precision industrial processes.

Model: THE-911811

Type: Arc Control Card

Function: Monitor and control arc status, protect power modules and process equipment

Application areas: semiconductor manufacturing, sputtering deposition, PVD/CVD process, scientific research experiments

Product Features

Arc detection and protection

Real time detection of arc occurrence can quickly respond to abnormal discharge and prevent equipment damage.

Built in overcurrent and overvoltage protection functions enhance system security.

high-precision control

Being able to accurately control the arc triggering and maintenance process, ensuring the stability and repeatability of plasma technology.

Strong compatibility

Can be used in conjunction with HUTTINGER series generators, power amplifiers, and matching networks to meet different process requirements.

Industrial grade reliability

High stability design, suitable for production environments with long-term continuous operation.

Strong anti-interference ability, suitable for process environments such as radio frequency and high voltage.

Modular and easy to maintain

Modular circuit design for quick replacement and maintenance.

Support integration into automation control systems to achieve remote monitoring and control.

Process optimization support

While controlling the arc, it can assist in optimizing process parameters and improving the process quality of thin film deposition, etching, or surface treatment.

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