Huttinger 1397547-01-361248控制发电机模块 PDF资料 

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HUTTINGER 1397547-01-361248 控制发电机模块

产品概述

Huttinger 1397547-01-361248 是一款 工业级控制发电机模块，主要用于高精度射频或等离子工艺系统中。该模块用于控制和调节发电机输出，实现稳定、高效的电力供应，并保证与负载（如等离子体腔体或功率放大器）之间的良好匹配。

• 型号：1397547-01-361248

• 类型：控制发电机模块

• 功能：控制和调节发电机输出，确保稳定电源和负载匹配

• 工业应用：半导体制造、薄膜沉积、真空等离子体处理

技术特点

1. 高精度控制：通过模块内部电路对发电机输出电压、电流及功率进行精确控制。

2. 稳定性强：适合长时间运行的工业工艺，保证射频或直流输出稳定。

3. 兼容性好：可与多种 HUTTINGER 发电机、功率放大器及匹配网络协同使用。

4. 保护功能完善：具有过流、过压和短路保护，提高系统安全性。

5. 模块化设计：方便替换、维护和升级，适合工业生产线和科研设备使用。

应用领域

1. 半导体制造

• 用于等离子刻蚀、溅射沉积及离子注入工艺中的射频或直流发电控制。

2. 薄膜沉积与表面处理

• 在 PVD/CVD、光学镀膜和工业涂层工艺中，提供稳定功率支持。

3. 真空等离子工艺

• 控制等离子体源功率，实现精确等离子激励和工艺优化。

4. 科研实验

• 在材料科学和等离子体物理实验中用作发电机输出控制模块。

5. 工业制造

• 应用于表面改性、功能薄膜加工和其他需要高稳定电源的工艺环节

英文资料：

HUTTINGER 1397547-01-361248 Control Generator Module

Product Overview

Huttinger 1397547-01-361248 is an industrial grade control generator module primarily used in high-precision RF or plasma process systems. This module is used to control and regulate the output of the generator, achieve stable and efficient power supply, and ensure good matching with loads such as plasma chambers or power amplifiers.

Model: 1397547-01-361248

Type: Control Generator Module

Function: Control and regulate generator output to ensure stable power supply and load matching

Industrial applications: semiconductor manufacturing, thin film deposition, vacuum plasma treatment

Technical Features

High precision control: precise control of the generator output voltage, current, and power through the internal circuit of the module.

Strong stability: Suitable for industrial processes that operate for long periods of time, ensuring stable RF or DC output.

Good compatibility: Can be used in conjunction with various HUTTINGER generators, power amplifiers, and matching networks.

Complete protection function: It has overcurrent, overvoltage, and short-circuit protection, improving system safety.

Modular design: easy to replace, maintain, and upgrade, suitable for industrial production lines and scientific research equipment.

Application field

Semiconductor Manufacturing

Used for RF or DC power generation control in plasma etching, sputtering deposition, and ion implantation processes.

Thin film deposition and surface treatment

Provide stable power support in PVD/CVD, optical coating, and industrial coating processes.

Vacuum plasma process

Control the power of the plasma source to achieve precise plasma excitation and process optimization.

Scientific research experiment

Used as a generator output control module in materials science and plasma physics experiments.

industrial manufacturing

Applied to surface modification, functional film processing, and other process links that require high stability power supply

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