Huttinger PFM1500A射频发电机 PDF资料 

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HUTTINGER PFM1500A 射频发电机

产品概述

Huttinger PFM1500A 是一款高性能 射频发电机，广泛应用于半导体、光伏、显示面板以及真空工艺设备中。该设备能够在标准射频频段（13.56 MHz）下输出稳定的射频功率，并配合匹配网络实现高效的能量传输。

• 型号：PFM1500A

• 输出功率：1500 W

• 工作频率：13.56 MHz（工业标准频段）

• 电源输入：230 V

• 输出接口：标准 50 Ω 同轴接口

技术特点

1. 高功率输出：支持 1500 W 级连续射频功率输出，满足高能量密度工艺需求。

2. 稳定频率：固定在 13.56 MHz，符合国际标准射频频段，适用于多种等离子工艺。

3. 自动阻抗匹配：与配套的匹配网络协同工作，实现等离子负载与电源之间的阻抗匹配，降低反射功率。

4. 高效散热设计：内部优化的散热系统保障长时间稳定运行。

5. 远程/本地控制：支持本地面板控制或外部接口远程控制，便于集成到自动化工艺设备中。

应用领域

1. 半导体制造

• 用于等离子刻蚀、离子注入、CVD/PVD 薄膜沉积。

2. 光伏产业

• 在太阳能电池的薄膜镀膜工艺中提供射频等离子激励。

3. 显示面板

• 在 TFT-LCD、OLED 制程中应用于大面积玻璃基板的薄膜沉积与处理。

4. 真空镀膜与材料表面处理

• 用于光学薄膜、硬质涂层、功能性薄膜的制备。

5. 科研实验平台

• 材料科学与等离子体物理实验中，作为稳定的射频能量源。

英文资料：

HUTTINGER PFM1500A RF Generator

Product Overview

Huttinger PFM1500A is a high-performance RF generator widely used in semiconductor, photovoltaic, display panel, and vacuum process equipment. This device is capable of outputting stable RF power in the standard RF frequency band (13.56 MHz) and achieving efficient energy transmission in conjunction with a matching network.

Model: PFM1500A

Output power: 1500 W

Operating frequency: 13.56 MHz (industrial standard frequency band)

Power input: 230 V

Output interface: Standard 50 Ω coaxial interface

Technical Features

High power output: Supports 1500 W level continuous RF power output to meet the requirements of high-energy density processes.

Stable frequency: fixed at 13.56 MHz, in line with international standard RF frequency band, suitable for various plasma processes.

Automatic impedance matching: works in conjunction with the matching network to achieve impedance matching between the plasma load and the power supply, reducing reflected power.

Efficient heat dissipation design: The internally optimized heat dissipation system ensures long-term stable operation.

Remote/Local Control: Supports local panel control or external interface remote control, making it easy to integrate into automated process equipment.

Application field

Semiconductor Manufacturing

Used for plasma etching, ion implantation, and CVD/PVD thin film deposition.

photovoltaic industry

Provide radio frequency plasma excitation in the thin film coating process of solar cells.

display panel

Applied to thin film deposition and processing of large-area glass substrates in TFT-LCD and OLED processes.

Vacuum Coating and Material Surface Treatment

Used for the preparation of optical films, hard coatings, and functional films.

Research Experiment Platform

As a stable RF energy source in materials science and plasma physics experiments.

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