Huttinger MAPKST0017高频功率放大器 PDF资料 

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HUTTINGER MAPKST0017 高频功率放大器

产品概述

Huttinger MAPKST0017 是一款工业级 高频射频功率放大器，主要用于半导体制造、真空等离子体工艺及科研领域。其核心设计为大功率输出与高频稳定性，能够在苛刻工艺条件下提供持续、精确的射频能量。

• 型号：MAPKST0017

• 类型：高频功率放大器（RF Amplifier）

• 输出功率：约 1 kW

• 工作频率：13.56 MHz

• 前级放大器管：MRF150

• 功率管：双 MAPKST0017 晶体管

• 散热方式：水冷散热，采用铜块结构以提升导热效率

技术特点

1. 大功率输出：具备 1 kW 级别射频输出，满足等离子体工艺的大能量需求。

2. 高频精确性：在 13.56 MHz 工业标准频段下稳定运行，适合薄膜沉积、等离子刻蚀等工艺。

3. 高效散热：采用水冷散热方案，保障长期高功率工作环境下的稳定性。

4. 模块化设计：前后级放大器配合，提升信号增益效率与可靠性。

5. 工业适用性强：结构坚固，适合连续生产型工艺设备。

应用领域

1. 半导体制造

• 用于等离子体刻蚀、离子注入、PVD/CVD 等真空工艺。

2. 光伏与显示面板

• 在太阳能电池及 OLED、LCD 面板生产中提供薄膜沉积能量。

3. 真空镀膜

• 应用于光学元件、工具涂层的高精度表面处理。

4. 工业加热

• 在高频感应加热、材料表面改性工艺中提供稳定功率。

5. 科研与实验

• 用于材料科学与射频工艺研究，提供高频能量支持。

英文资料：

HUTTINGER MAPKST0017 High Frequency Power Amplifier

Product Overview

Huttinger MAPKST0017 is an industrial grade high-frequency RF power amplifier mainly used in semiconductor manufacturing, vacuum plasma technology, and scientific research fields. Its core design is high-power output and high-frequency stability, which can provide continuous and accurate RF energy under harsh process conditions.

Model: MAPKST0017

Type: High frequency power amplifier (RF Amplifier)

Output power: approximately 1 kW

Operating frequency: 13.56 MHz

Front stage amplifier tube: MRF150

Power transistor: Dual MAPKST0017 transistor

Heat dissipation method: water-cooled heat dissipation, using copper block structure to improve thermal conductivity efficiency

Technical Features

High power output: With a 1 kW level RF output, it meets the high energy requirements of plasma processes.

High frequency accuracy: Stable operation in the 13.56 MHz industrial standard frequency band, suitable for processes such as thin film deposition and plasma etching.

Efficient heat dissipation: Adopting a water-cooled heat dissipation solution to ensure stability in long-term high-power working environments.

Modular design: The combination of front-end and back-end amplifiers enhances signal gain efficiency and reliability.

Strong industrial applicability: sturdy structure, suitable for continuous production process equipment.

Application field

Semiconductor Manufacturing

Used for vacuum processes such as plasma etching, ion implantation, PVD/CVD, etc.

Photovoltaic and Display Panel

Provide thin film deposition energy in the production of solar cells, OLED, and LCD panels.

vacuum coating

High precision surface treatment applied to optical components and tool coatings.

Industrial Heating

Provide stable power in high-frequency induction heating and material surface modification processes.

Research and experimentation

Used for materials science and RF process research, providing high-frequency energy support.

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