Huttinger TIG 10/100 喷射等离子控制面板 PDF资料
1.产 品 资 料 介 绍:
Huttinger TIG 10/100 喷射等离子控制面板
产品概述
Huttinger TIG 10/100 是一款用于喷射(溅射)等离子系统的专用控制面板,主要作用是在真空环境下对等离子体产生与运行进行电源管理与工艺调控。其设计兼顾稳定性与精确性,确保薄膜沉积等工艺中等离子体状态的可控性。
型号:TIG 10/100
制造商:Huttinger Elektronik
电压规格:208V
设备尺寸:宽约 15 英寸,高约 10 英寸,深约 30 英寸
重量:约 15 磅
技术特点
高稳定性电源控制:在溅射工艺中提供持续、稳定的能量输出,避免等离子体不均匀或波动。
精确工艺调节:通过控制面板参数调节,可对等离子体功率与过程条件进行优化。
工业级设计:适合长时间运行的真空镀膜与半导体制程设备。
兼容性强:可与多种真空溅射设备集成使用,支持工艺扩展与升级。
应用领域
半导体制造
用于集成电路和晶圆工艺的薄膜沉积与刻蚀。
光伏产业
在太阳能电池生产中用于镀膜工艺,提升电池片性能。
平板显示制造
应用于 TFT-LCD、OLED 等显示面板的大面积玻璃基板加工。
光学镀膜
在光学元件(透镜、滤光片)生产中用于高精度薄膜沉积。
科研实验
用于材料科学、等离子体工艺研究与实验平台。
英文资料:
Huttinger TIG 10/100 Spray Plasma Control Panel
Product Overview
Huttinger TIG 10/100 is a specialized control panel for jet (sputtering) plasma systems, mainly used for power management and process control of plasma generation and operation in a vacuum environment. Its design balances stability and accuracy, ensuring the controllability of plasma states in processes such as thin film deposition.
Model: TIG 10/100
Manufacturer: Huttinger Elektronik
Voltage specification: 208V
Equipment dimensions: approximately 15 inches wide, 10 inches high, and 30 inches deep
Weight: Approximately 15 pounds
Technical Features
High stability power control: Provides continuous and stable energy output in the sputtering process, avoiding plasma non-uniformity or fluctuations.
Precise process adjustment: By adjusting the parameters on the control panel, the plasma power and process conditions can be optimized.
Industrial grade design: Suitable for long-term operation of vacuum coating and semiconductor process equipment.
Strong compatibility: It can be integrated with various vacuum sputtering equipment and supports process expansion and upgrading.
Application field
Semiconductor Manufacturing
Thin film deposition and etching for integrated circuit and wafer processes.
photovoltaic industry
Used in the coating process of solar cell production to enhance the performance of solar cells.
Flat panel display manufacturing
Applied to large-area glass substrate processing for display panels such as TFT-LCD and OLED.
Optical Coating
Used for high-precision thin film deposition in the production of optical components (lenses, filters).
Scientific research experiment
Used for materials science, plasma technology research and experimental platforms.
2.产 品 展 示
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