AMAT Applied Materials 0190-48491适配器 PDF资料 

1.产 品 资 料 介 绍：

AMAT Applied Materials 0190-48491 适配器（离子计组件）产品应用领域

一、产品概述

AMAT Applied Materials 0190-48491 是一款 双灯丝热离子计（Dual Filament Hot Ion Gauge）组件，常被用于真空系统中作为压力检测传感器。
该组件能够测量从高真空到超高真空范围内的压力，常用于半导体工艺设备的真空监控与反馈控制系统。

它属于 AMAT（应用材料公司）设备中的核心真空测控元件，尤其用于高密度等离子体（HDP）CVD 及 PVD 工艺平台，如 AMAT HDP100、Endura、Centura 等系列。

二、技术特性

• 类型：双灯丝热离子真空计（Dual Filament Hot Cathode Ion Gauge）

• 测量范围：约 10⁻⁵ ～ 10⁻⁹ Torr

• 输出信号：0.8～10 V 模拟电压信号

• 安装方式：标准真空法兰接口（配合真空系统腔体安装）

• 应用特征：高灵敏度、响应速度快、可在恶劣真空工况下长期稳定工作

• 常与：真空控制器、电源模块、真空泵系统共同构成闭环压力控制系统

三、产品应用领域

AMAT Applied Materials  0190-48491适配器  英文介绍

AMAT Applied Materials 0190-48491 Adapter (Ion Meter Component) Product Application Fields

1、 Product Overview

AMAT Applied Materials 0190-48491 is a Dual Filament Hot Ion Gauge component commonly used as a pressure sensing sensor in vacuum systems.

This component is capable of measuring pressure ranging from high vacuum to ultra-high vacuum, and is commonly used in vacuum monitoring and feedback control systems for semiconductor process equipment.

It belongs to the core vacuum measurement and control component in AMAT (Applied Materials Company) equipment, especially used for high-density plasma (HDP) CVD and PVD process platforms, such as AMAT HDP100, Endura, Centura and other series.

2、 Technical characteristics

Type: Dual Filament Hot Cathode Ion Gauge

Measurement range: approximately 10 ⁻⁵ to 10 ⁻⁹ Torr

Output signal: 0.8-10 V analog voltage signal

Installation method: Standard vacuum flange interface (installed in conjunction with the vacuum system chamber)

Application features: high sensitivity, fast response speed, and long-term stable operation under harsh vacuum conditions

Often used in conjunction with vacuum controllers, power modules, and vacuum pump systems to form a closed-loop pressure control system

3、 Product application areas

Specific role of application field

Semiconductor manufacturing equipment is used to monitor the vacuum pressure in chambers such as CVD (chemical vapor deposition), PVD (physical vapor deposition), ALD (atomic layer deposition), etching, etc. Real time pressure detection is achieved through ionization principle to ensure stable operation of the process under set vacuum conditions.

During plasma processing, controlling the vacuum degree is a key parameter for maintaining ion energy and density in plasma reaction equipment. This ion meter can provide real-time feedback on the vacuum status of the chamber.

The ion implantation equipment maintains a stable high vacuum inside the implantation chamber to prevent ion beam scattering and improve implantation accuracy.

As vacuum monitoring sensors, vacuum pumps and system monitoring are used in conjunction with mechanical pumps, molecular pumps, turbo pumps, etc. to provide feedback on vacuum system pressure and ensure stable pump performance.

Equipment maintenance and calibration are used for system vacuum degree verification, sealing detection, leakage diagnosis, and equipment status assessment.

AMAT Applied Materials 0190-48491适配器 产品展示      

3.其他产品

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Motorola MVME2400-0361 单板计算机
Woodward 8290-185速度控制器

4.其他英文产品

FOXBORO 0399143 SY-0301060R Industrial control card
SY-1025115C SY-1025120E Industrial control card
FOXBORO 0399144 SY-0301059F module

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