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Gasonics 853-4290-101负载锁电梯模块

作者:ysh 发布时间:2025-07-29 14:19:49 次浏览

Gasonics 853-4290-101负载锁电梯模块 PDF资料 1.产 品 资 料 介 绍:产品名称:Gasonics 853-4290-101 负载锁电梯模块功能定位:半导体设备中用于负载锁腔晶圆升降控制的关键执行机构一、半导体晶圆处理系统该模块广泛用于 Gasonics Aura 等离子清洗设备中,负责将晶圆从大气环境下传送至真空环境内,实现晶圆升降与精确对位。典型用途:晶圆清洗、灰化

 Gasonics 853-4290-101负载锁电梯模块 PDF资料 

1.产 品 资 料 介 绍:

产品名称:Gasonics 853-4290-101 负载锁电梯模块
功能定位:半导体设备中用于负载锁腔晶圆升降控制的关键执行机构


一、半导体晶圆处理系统

该模块广泛用于 Gasonics Aura 等离子清洗设备中,负责将晶圆从大气环境下传送至真空环境内,实现晶圆升降与精确对位。

典型用途

  • 晶圆清洗、灰化、去胶前的上下料搬运

  • 负载锁与处理腔之间的晶圆转运

  • 保证真空条件下的高精度晶圆升降操作


二、真空自动传输系统

在等离子处理设备中,该模块常与机械手或转运平台配合使用,承担晶圆在负压环境中垂直移动的功能。

适用场景

  • 多腔体处理系统中的上下料对接

  • 晶圆预处理或后处理前的传输准备

  • 与 AMHS 系统、前段 FOUP 接口连通对接


三、光刻工艺前后清洗环节

负载锁电梯模块用于光刻制程前后段的表面处理步骤,确保晶圆表面洁净,避免颗粒污染。

具体应用

  • 光刻前除胶清洗

  • 光刻后残留物去除

  • 多层工艺之间的晶圆中转升降

英文资料:

Product Name: Gasonics 853-4290-101 Load Lock Elevator Module

Functional positioning: Key actuator for load lock chamber wafer lifting control in semiconductor equipment


1、 Semiconductor wafer processing system

This module is widely used in Gasonics Aura plasma cleaning equipment, responsible for transferring wafers from atmospheric environment to vacuum environment, achieving wafer lifting and precise alignment.


Typical use:


Handling of loading and unloading materials before wafer cleaning, ashing, and debonding


Wafer transfer between load lock and processing chamber


Ensure high-precision wafer lifting operation under vacuum conditions


2、 Vacuum automatic transmission system

In plasma processing equipment, this module is often used in conjunction with robotic arms or transfer platforms to perform the function of vertical movement of wafers in negative pressure environments.


Applicable scenarios:


Loading and unloading docking in multi chamber processing system


Preparation for transportation before wafer pre-processing or post-processing


Connect and interface with AMHS system and front-end FOUP interface


3、 Cleaning steps before and after photolithography process

The load lock elevator module is used for surface treatment steps before and after the photolithography process to ensure the cleanliness of the wafer surface and avoid particle contamination.


Specific application:


Pre lithography degreasing and cleaning


Removal of residues after photolithography


Wafer transfer lifting between multi-layer processes

2.产      品      展      示      

asyst_853-4290-101_load_lock_elevator_gasonics_94-1119_used_working.jpg

3.其他产品

ABB 573800121D 驱动器模块

ABB GFD233A103 接口板模块

ASEA 2668 180-74板式冷却器

4.其他英文产品

Asea EB0524B01 driver input power board

ABB UN1024c-P Remote Terminal Module

ABB 70BK03c-E Control I/O Module

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