AMAT Applied Materials 0090-01419射频发电机 PDF资料
1.产 品 资 料 介 绍：
AMAT Applied Materials 0090-01419 射频发电机
一、产品概述
AMAT 0090-01419 是应用材料公司（Applied Materials）用于半导体设备中的 射频（RF）功率生成模块，主要用于 等离子体工艺控制。
该射频发电机可将直流或低频电源转换为高频射频信号，为 PVD（物理气相沉积）、CVD（化学气相沉积）、Etch（刻蚀） 等工艺提供稳定的等离子体能量。
该模块通常与 RF 匹配网络（Matching Network） 配合使用，实现等离子体腔体的阻抗匹配，提高能量传输效率。
二、产品功能
射频功率输出
产生高频电磁信号（常见 13.56 MHz 或 2 MHz），驱动工艺腔体等离子体。
输出功率可调，支持不同工艺阶段的能量需求。
自动阻抗匹配支持
与匹配网络协同工作，减少反射功率，提高 RF 能量传输效率。
适应腔体负载变化，实现稳定等离子体状态。
实时监控与保护
内置过流、过压、过温和反射功率保护。
提供状态反馈，可与设备控制系统通信，实现远程监控。
与工艺系统集成
与 AMAT Endura、Centura、Producer 等系统兼容。
支持模块化安装，便于维护和更换。
三、产品特点
高稳定性射频输出
输出功率稳定，波形纯净，保证等离子体均匀性和工艺重复性。
自动匹配与快速响应
可快速调整输出功率和频率，以适应不同工艺要求。
匹配时间通常 <100 ms，满足快速工艺切换需求。
工业级设计
高可靠性元件，适应半导体设备长时间 24/7 运行环境。
耐高温、耐振动和抗电磁干扰。
模块化安装
支持即插即用式安装，与 AMAT 控制柜和模块化电源系统兼容。
易于维护和升级，无需整体停机。
安全保护机制
内置过压、过流、过热保护。
提供反射功率检测与报警功能，防止对腔体和电源的损伤。
AMAT Applied Materials 0090-01419射频发电机 英文介绍
AMAT Applied Materials 0090-01419 RF Generator
1、 Product Overview
AMAT 0090-01419 is a radio frequency (RF) power generation module used by Applied Materials for semiconductor equipment, primarily for plasma process control.
This RF generator can convert DC or low-frequency power into high-frequency RF signals, providing stable plasma energy for processes such as PVD (Physical Vapor Deposition), CVD (Chemical Vapor Deposition), Etch (Etch), etc.
This module is typically used in conjunction with an RF Matching Network to achieve impedance matching of the plasma chamber and improve energy transfer efficiency.
2、 Product Features
RF power output
Generate high-frequency electromagnetic signals (commonly 13.56 MHz or 2 MHz) to drive the plasma in the process chamber.
The output power is adjustable and supports the energy requirements of different process stages.
Automatic impedance matching support
Collaborate with matching networks to reduce reflected power and improve RF energy transmission efficiency.
Adapt to changes in chamber load and achieve stable plasma state.
Real time monitoring and protection
Built in overcurrent, overvoltage, overtemperature, and reflected power protection.
Provide status feedback, communicate with the device control system, and achieve remote monitoring.
Integration with process systems
Compatible with AMAT Endura, Centura, Producer and other systems.
Support modular installation for easy maintenance and replacement.
3、 Product Features
High stability RF output
Stable output power, pure waveform, ensuring plasma uniformity and process repeatability.
Automatic matching and fast response
It can quickly adjust the output power and frequency to meet different process requirements.
The matching time is usually less than 100 ms, meeting the requirements for rapid process switching.
Industrial-grade design
High reliability components, suitable for long-term 24/7 operation environment of semiconductor equipment.
High temperature resistance, vibration resistance, and electromagnetic interference resistance.
modular installation
Supports plug and play installation, compatible with AMAT control cabinets and modular power systems.
Easy to maintain and upgrade, without the need for a complete shutdown.
Security protection mechanism
Built in overvoltage, overcurrent, and overheating protection.
Provide reflection power detection and alarm function to prevent damage to the cavity and power supply.
AMAT Applied Materials 0090-01419射频发电机 产品展示
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