AMAT Applied Materials 0041-78374射频匹配组件 PDF资料 

1.产 品 资 料 介 绍：

一、产品概述

AMAT Applied Materials 0041-78374 射频匹配组件是一种用于半导体工艺设备的关键射频模块，主要用于将射频电源与等离子体负载之间进行阻抗匹配。它能够最大化功率传输效率，减少反射功率，保证等离子体放电的稳定性，从而提升工艺一致性与良率。该组件通常与 AMAT 的射频电源、腔体和控制模块协同工作。

二、技术参数（推测整理）

• 功能定位：射频阻抗匹配组件，适配腔体负载变化

• 工作频率：典型支持 13.56 MHz，可支持多频射频系统

• 功率范围：适合数百瓦至数千瓦射频功率传输

• 控制方式：可自动匹配或通过主控系统进行控制

• 接口：射频同轴连接器，控制信号接口与主控系统或匹配器控制板连接

• 冷却方式：风冷或水冷（视版本而定），保证长期稳定运行

• 版本修订：存在不同修订（如 Rev A/B），在接口、控制或功率能力上略有差异

三、应用场景

• 等离子体刻蚀系统：匹配腔体负载，提升刻蚀速率和均匀性

• 化学气相沉积（CVD）/原子层沉积（ALD）：保证沉积过程中的等离子体稳定

• 离子注入和灰化工艺：为需要 RF 放电的工艺模块提供稳定功率

• AMAT 机台射频系统：与射频电源、控制模块及腔体系统协同工作

四、产品优势

1. 高效能量传输：自动匹配阻抗，减少反射功率，提高 RF 功率利用率

2. 稳定性高：保障腔体等离子体长期稳定运行，提高工艺一致性

3. 模块化设计：独立组件便于维护和更换，缩短设备停机时间

4. 工艺适配性强：专为 AMAT 工艺腔室设计，匹配范围宽，适应多种工艺条件

5. 保护功能：具备过压、过流和高反射功率保护，延长设备使用寿命

AMAT Applied Materials 0041-78374射频匹配组件 英文介绍

1、 Product Overview

AMAT Applied Materials 0041-78374 RF Matching Component is a key RF module used in semiconductor process equipment, mainly used for impedance matching between RF power supply and plasma load. It can maximize power transmission efficiency, reduce reflected power, ensure the stability of plasma discharge, and thus improve process consistency and yield. This component typically works in conjunction with AMAT's RF power supply, cavity, and control module.

2、 Technical parameters (speculated and organized)

Functional positioning: RF impedance matching component, adapted to changes in cavity load

Operating frequency: Typically supports 13.56 MHz and can support multi frequency RF systems

Power Range: Suitable for RF power transmission ranging from several hundred watts to several kilowatts

Control mode: can be automatically matched or controlled through the main control system

Interface: RF coaxial connector, control signal interface connected to the main control system or matching control board

Cooling method: air-cooled or water-cooled (depending on the version) to ensure long-term stable operation

Version revision: There are different revisions (such as Rev A/B) with slight differences in interface, control, or power capabilities

3、 Application scenarios

Plasma etching system: matching chamber load to improve etching rate and uniformity

Chemical vapor deposition (CVD)/atomic layer deposition (ALD): ensuring plasma stability during the deposition process

Ion implantation and ashing process: providing stable power for process modules that require RF discharge

AMAT machine RF system: works in conjunction with RF power supply, control module, and cavity system

4、 Product advantages

Efficient energy transmission: automatically matching impedance, reducing reflected power, and improving RF power utilization efficiency

High stability: ensuring long-term stable operation of the cavity plasma and improving process consistency

Modular design: independent components for easy maintenance and replacement, reducing equipment downtime

Strong process adaptability: specially designed for AMAT process chambers, with a wide matching range and adaptability to various process conditions

Protection function: Equipped with overvoltage, overcurrent, and high reflection power protection, extending the service life of the equipment

AMAT Applied Materials 0041-78374射频匹配组件 产品展示      

3.其他产品

TRICONEX 3401 Digital Output Module
TRICONEX 3351分析输入模块
TRICONEX 3301 数字输入模块

4.其他英文产品

MPL-B540K-SJ24AA/A motor
PFTL101A 1.0KN 3BSE004166R1 Tension sensor
07KT97 GJR5253000R4270 module

本篇文章出自瑞昌明盛自动化设备有限公司官网，转载请附上此链接:http://www.jiangxidcs

品牌：AMAT Applied Materials

型号：0041-78374射频匹配组件

质保：一年

成色：全新/二手

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