AMAT Applied Materials 0190-16177射频匹配导航器 PDF资料
1.产 品 资 料 介 绍:
产品概述
AMAT Applied Materials 0190-16177 射频匹配导航器(RF Matching Navigator)是一种用于半导体工艺设备的射频控制模块。它主要功能是在等离子刻蚀或沉积工艺中,实现射频功率与工艺腔体阻抗的动态匹配,从而优化等离子弧的稳定性和工艺均匀性。该模块通常与射频功率源、等离子电流控制板及主控制系统协作,形成闭环控制系统。
技术参数(典型特征,具体参数需参考实物或官方资料)
产品类型:射频匹配控制模块
主要功能:
实时监测等离子腔体阻抗
调节射频功率输出,实现阻抗匹配
与主机或控制板协作,实现工艺自动化
接口类型:模块化电子接口,兼容 AMAT 控制系统
电气特性:
支持高精度射频信号测量与调节
快速响应控制,保证工艺稳定性
抗干扰能力强,适应工业环境
机械特性:工业级 PCB 或模块化设计,便于安装与维护
应用场景
等离子刻蚀和沉积工艺:实时匹配射频功率与工艺腔体阻抗,优化工艺均匀性。
工艺稳定控制:监控等离子弧参数,防止电流或功率异常。
系统集成:与射频功率源、等离子弧电流控制板及 I/O 模块协同,形成闭环自动化控制系统。
设备维护与优化:模块化设计便于替换和调试,提升设备运行效率。
AMAT Applied Materials 0190-16177射频匹配导航器 英文介绍
Product Overview
AMAT Applied Materials 0190-16177 RF Matching Navigator is an RF control module used for semiconductor process equipment. Its main function is to achieve dynamic matching between RF power and process cavity impedance in plasma etching or deposition processes, thereby optimizing the stability and process uniformity of the plasma arc. This module typically collaborates with the RF power source, plasma current control board, and main control system to form a closed-loop control system.
Technical parameters (typical features, specific parameters need to refer to physical objects or official materials)
Product type: RF matching control module
Main functions:
Real time monitoring of plasma chamber impedance
Adjust RF power output to achieve impedance matching
Collaborate with the host or control board to achieve process automation
Interface type: Modular electronic interface, compatible with AMAT control system
Electrical characteristics:
Support high-precision RF signal measurement and adjustment
Quick response control ensures process stability
Strong anti-interference ability and adaptability to industrial environments
Mechanical characteristics: Industrial grade PCB or modular design, easy to install and maintain
Application scenarios
Plasma etching and deposition process: Real time matching of RF power and process cavity impedance to optimize process uniformity.
Process stability control: Monitor plasma arc parameters to prevent abnormal current or power.
System integration: Collaborate with RF power source, plasma arc current control board, and I/O module to form a closed-loop automation control system.
Equipment maintenance and optimization: Modular design facilitates replacement and debugging, improving equipment operational efficiency.
AMAT Applied Materials 0190-16177射频匹配导航器 产品展示
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