AMAT Applied Materials 0010-99060气体面板 PDF资料
1.产 品 资 料 介 绍:
产品概述
AMAT Applied Materials 0010-99060 气体面板是一款用于半导体制造设备的核心气体控制模块。它负责将工艺气体安全、精确地输送至工艺腔体或反应区,并监控气体流量、压力和混合比例。该气体面板广泛应用于刻蚀、沉积(CVD/PVD)、离子注入等工艺环节,是保证工艺稳定性和产品一致性的关键部件。
技术参数(典型特征,具体参数需参考实物或官方资料)
产品类型:气体控制面板
主要功能:
精确控制气体流量、压力和混合比例
监测气体状态,提供安全报警
支持工艺参数接口,连接控制系统进行自动化管理
接口类型:气体管路接口、电子信号接口(与控制系统连接)
气体兼容性:适用于多种工艺气体(如 N₂、Ar、O₂、Cl₂ 等)
机械特性:工业级面板设计,便于安装与维护
安全特性:过压保护、泄漏检测和紧急切断功能
应用场景
半导体工艺气体控制:在刻蚀、沉积、离子注入等工艺中实现精确气体管理。
工艺参数稳定:确保气体流量和混合比例稳定,提高工艺重复性和产品良率。
设备安全保护:通过实时监测和报警功能,防止气体泄漏或压力异常。
系统集成:与主机、I/O 模块、继电器模块、气体传感器等协作,实现自动化气体控制系统。
产品优势
精确控制:高精度流量与压力调节,保证工艺稳定性。
安全可靠:具备过压保护、泄漏检测和紧急切断功能。
模块化设计:便于安装、更换和维护,缩短停机时间。
兼容性好:与 AMAT 系统控制模块深度适配,实现自动化工艺控制。
AMAT Applied Materials 0010-99060气体面板 英文介绍
Product Overview
AMAT Applied Materials 0010-99060 gas panel is a core gas control module used in semiconductor manufacturing equipment. It is responsible for safely and accurately delivering process gases to the process chamber or reaction zone, and monitoring gas flow rate, pressure, and mixing ratio. This gas panel is widely used in etching, deposition (CVD/PVD), ion implantation and other process steps, and is a key component to ensure process stability and product consistency.
Technical parameters (typical features, specific parameters need to refer to physical objects or official materials)
Product Type: Gas Control Panel
Main functions:
Accurately control gas flow rate, pressure, and mixing ratio
Monitor gas status and provide safety alarms
Support process parameter interface, connect control system for automated management
Interface types: gas pipeline interface, electronic signal interface (connected to control system)
Gas compatibility: Suitable for various process gases (such as N ₂, Ar, O ₂, Cl ₂, etc.)
Mechanical characteristics: Industrial grade panel design, easy to install and maintain
Safety features: overvoltage protection, leakage detection, and emergency shutdown function
Application scenarios
Semiconductor process gas control: achieving precise gas management in processes such as etching, deposition, and ion implantation.
Stable process parameters: Ensure stable gas flow rate and mixing ratio, improve process repeatability and product yield.
Equipment security protection: Through real-time monitoring and alarm functions, prevent gas leaks or abnormal pressure.
System integration: Collaborate with the host, I/O modules, relay modules, gas sensors, etc. to achieve an automated gas control system.
Product advantages
Precise control: high-precision flow and pressure regulation to ensure process stability.
Safe and reliable: equipped with overvoltage protection, leakage detection, and emergency shutdown functions.
Modular design: easy to install, replace, and maintain, reducing downtime.
Good compatibility: Deeply compatible with the AMAT system control module to achieve automated process control.
AMAT Applied Materials 0010-99060气体面板 产品展示
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