AMAT Applied Materials 4100-060G-M02压力传感器 PDF资料
1.产 品 资 料 介 绍：
产品概述
AMAT 4100-060G-M02 是 Applied Materials 半导体设备使用的 压力传感器组件。该类传感器主要用于对真空腔体、气路或工艺环境中的压力进行 实时检测与反馈，保证工艺过程的稳定性和重复性。它属于 AMAT 设备的关键检测元件之一。
技术参数（结合公开信息与常见 AMAT 压力传感器特性推断）
类型：压力传感器（Pressure Transducer / Gauge）。
测量范围：典型为 高真空至大气压力范围（如 10⁻⁶ Torr ~ 760 Torr），不同版本覆盖不同压力段。
输出信号：常见为 模拟电压/电流输出（如 0-10 VDC 或 4-20 mA），部分型号支持数字接口。
安装方式：法兰或螺纹接口，便于腔体或管路安装。
精度与稳定性：适用于半导体工艺的高精度压力控制，具备良好的长期稳定性与重复性。
环境适应性：可在高洁净、低颗粒环境中运行，部分型号具备抗腐蚀结构。
应用场景
真空腔体压力监控
安装在 CVD、PVD、Etch 等工艺腔体中，实时反馈真空度。
气体流量与排气系统控制
配合质量流量控制器（MFC）、阀门，实现气体输入与抽气的闭环控制。
工艺稳定性保障
在沉积、刻蚀等过程中，通过压力传感器信号调节真空泵与阀门动作，保证工艺一致性。
安全保护
当压力超出设定范围时，触发联锁保护，避免腔体损坏或工艺异常。
产品优势
高灵敏度与精度：满足亚微米级半导体工艺对压力控制的苛刻要求。
快速响应：能实时反映腔体压力波动，支持快速工艺切换。
可靠性强：适合长时间运行，稳定性高，减少校准频率。
兼容性好：为 AMAT 机台定制，接口与通信方式与整机系统无缝匹配。
AMAT Applied Materials 4100-060G-M02压力传感器 英文资料：
Product Overview
AMAT 4100-060G-M02 is a pressure sensor component used in Applied Materials semiconductor equipment. This type of sensor is mainly used for real-time detection and feedback of pressure in vacuum chambers, gas paths, or process environments, ensuring the stability and repeatability of the process. It is one of the key detection components of AMAT equipment.
Technical parameters (inferred based on public information and common AMAT pressure sensor characteristics)
Type: Pressure Sensor/Gauge.
Measurement range: Typically ranging from high vacuum to atmospheric pressure (such as 10 ⁻⁶ Torr~760 Torr), with different versions covering different pressure ranges.
Output signal: commonly used as analog voltage/current output (such as 0-10 VDC or 4-20 mA), some models support digital interfaces.
Installation method: Flanged or threaded interface for easy installation of cavities or pipelines.
Accuracy and stability: Suitable for high-precision pressure control in semiconductor processes, with good long-term stability and repeatability.
Environmental adaptability: It can operate in high cleanliness and low particle environments, and some models have corrosion-resistant structures.
Application scenarios
Vacuum chamber pressure monitoring
Installed in CVD, PVD, Etch and other process chambers, providing real-time feedback on vacuum level.
Gas flow and exhaust system control
Cooperate with a Mass Flow Controller (MFC) and valves to achieve closed-loop control of gas input and extraction.
Process stability guarantee
During sedimentation, etching, and other processes, the vacuum pump and valve actions are regulated by pressure sensor signals to ensure process consistency.
safety protection
When the pressure exceeds the set range, the interlock protection is triggered to avoid chamber damage or process abnormalities.
Product advantages
High sensitivity and precision: meet the demanding pressure control requirements of sub micron semiconductor processes.
Quick response: able to reflect real-time pressure fluctuations in the chamber and support rapid process switching.
Strong reliability: suitable for long-term operation, high stability, and reduces calibration frequency.
Good compatibility: Customized for AMAT machines, the interface and communication methods seamlessly match the entire system.
AMAT Applied Materials 4100-060G-M02压力传感器 产品展示
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4.其他英文产品
AMAT 0100-02735 Ethernet interface module
AMAT 0100-01086 Remote control card
AMAT 0100-00484 Vibration card
| IC3600SCBD2A | 531X212DPCAAG1 | IC3600SPSV1 |
| IC3600SCBD2 | 531X211KLDADG1 | IC3600SPSU1 |
| IC3600SCBD1A | 531X211KLDACG1 | IC3600SPSS1 |
| IC3600SCBD1 | 531X211KLDABG1 | IC3600SPSP1B |
| IC3600SCBC1A | 531X211KLDAAG1 | IC3600SPSJ1 |
| IC3600SCBC1 | 531X210DMANN1 | IC3600SPSG1 |
| IC3600SCBB1B | 531X210DM凸轮 | IC3600SPRF1D |
| IC3600SCBB1A | 531X210DMCAMM1 | IC3600SPRF1 |
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