AMAT Applied Materials 0021-96788气动模块 PDF资料
1.产 品 资 料 介 绍：
AMAT Applied Materials 0021-96788 气动模块
产品概述
0021-96788 是 AMAT 半导体设备中的 气动模块（Pneumatic Module），用于控制设备内的气动执行元件，如阀门、气缸和真空泵。该模块通过精确控制气压和气流，实现半导体工艺设备中各种机械动作的自动化和高可靠运行。
技术功能与特点
气动控制
提供稳定的气压输出，驱动气动阀、气缸及其他执行器。
支持精确调节气流和响应时间，满足高精度工艺要求。
多通道设计
可同时控制多个气动执行器，实现复杂的工艺动作序列。
支持模块化组合，便于扩展或定制气动控制方案。
安全与保护
内置过压保护、防泄漏设计，确保设备和晶圆安全。
可与设备控制器和互锁系统联动，在异常情况下自动断气或停止动作。
模块化结构
便于拆装、维护和更换，减少停机时间。
设计符合半导体洁净室标准，防尘、防污染。
应用领域
气体阀门控制
在 CVD、PVD、ALD 等设备中控制反应气体和载气流量。
精确控制气体切换和比例，保证工艺稳定性。
晶圆搬运与 Loadlock 系统
控制升降机、气动机械手和舱门动作，实现自动化晶圆搬运。
真空与排气系统
调节真空泵入口阀门，确保腔体压力控制精确。
控制尾气排放阀门，保证排放安全。
自动化工艺设备
配合控制器实现设备气动动作自动化，提高工艺重复性和生产效率。
AMAT Applied Materials 0021-96788气动模块 英文资料：
AMAT Applied Materials 0021-96788 Pneumatic Module
Product Overview
0021-96788 is a pneumatic module in AMAT semiconductor equipment, used to control pneumatic actuators such as valves, cylinders, and vacuum pumps inside the equipment. This module achieves automation and high reliability operation of various mechanical actions in semiconductor process equipment by precisely controlling air pressure and airflow.
Technical functions and features
Pneumatic control
Provide stable air pressure output to drive pneumatic valves, cylinders, and other actuators.
Support precise adjustment of airflow and response time to meet high-precision process requirements.
Multi-channel Design
Multiple pneumatic actuators can be controlled simultaneously to achieve complex process action sequences.
Support modular combination for easy expansion or customization of pneumatic control solutions.
Security and protection
Built in overvoltage protection and leak proof design ensure equipment and wafer safety.
It can be linked with the device controller and interlock system to automatically cut off gas or stop operation in case of abnormal conditions.
Modular structure
Easy to disassemble, maintain, and replace, reducing downtime.
Designed to comply with semiconductor cleanroom standards, dust-proof and pollution proof.
Application field
Gas valve control
Control the flow rate of reaction gas and carrier gas in CVD, PVD, ALD and other equipment.
Accurately control gas switching and ratio to ensure process stability.
Wafer Handling and Loadlock System
Control the movement of elevators, pneumatic manipulators, and cabin doors to achieve automated wafer handling.
Vacuum and exhaust system
Adjust the inlet valve of the vacuum pump to ensure precise control of chamber pressure.
Control the exhaust emission valve to ensure emission safety.
Automated process equipment
Cooperate with the controller to achieve automation of equipment pneumatic actions, improve process repeatability and production efficiency.
AMAT Applied Materials 0021-96788气动模块 产品展示
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| S32GNNA-RNNM-00 | SC453-004-15 | SCE906-001-01 |
| S32GNNA-RNNE-00 | SC453-804-05 | SCE904-001-01 |
| S32GNNA-HGNM-00 | SC452-815-05 | SC9020010104G108 |
| S32GNAA-RNVE-00 | SC453-040-08 | SC900-001-01 |
| S32GMNA-RNNM-00 | SC722A-001-PM72008 | SCE905-001-00 |
| S31HSNA-RNNM-03 | SC452-051-06 | SC902-001-01 |
| S31HNNA-RNNM-00 | SC724A-001-PM72012 | SCE905NN-001-01 |
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