AMAT Applied Materials 0225-33921控制器装置 PDF资料
1.产 品 资 料 介 绍：
AMAT Applied Materials 0225-33921 控制器装置
产品概述
0225-33921 是 AMAT 半导体设备中的 控制器装置（Controller Unit），作为工艺设备的核心控制单元，负责管理和协调设备各子系统的运行。该装置主要用于采集传感器数据、执行工艺逻辑、下达控制命令，并与上位控制系统通信，保证半导体工艺的稳定性和安全性。
技术功能与特点
多通道信号处理
接收来自气体面板、真空系统、温度传感器、电源模块等多路输入信号。
进行逻辑判断和数据处理，并下发执行指令。
互锁与安全控制
内置互锁逻辑，防止在腔体未达安全条件或系统异常时进行操作。
对关键工艺环节进行硬件级保护，降低风险。
通信与接口能力
支持与上位控制计算机或 PLC 系统通信，实现数据上传与远程监控。
提供标准化接口，可兼容 AMAT 其他控制卡和模块。
模块化设计
可拆卸、更换和升级，方便维护和功能扩展。
设计适应半导体设备的高洁净环境和连续运作需求。
应用领域
CVD / PVD 工艺设备
控制气体流量、腔体压力、加热器和电源模块，实现沉积工艺稳定。
刻蚀与清洗设备
管理等离子体源、气体输入、温控系统和执行器，确保刻蚀/清洗精度。
晶圆传输系统
协调 Loadlock 舱门、搬运机器人和升降机操作，保证晶圆搬运安全。
自动化生产线
实现工艺参数自动监控和执行，提升设备运行效率和产能
AMAT Applied Materials 0225-33921控制器装置 英文资料：
AMAT Applied Materials 0225-33921 Controller Device
Product Overview
0225-33921 is a controller unit in AMAT semiconductor equipment, which serves as the core control unit of the process equipment and is responsible for managing and coordinating the operation of various subsystems of the equipment. This device is mainly used to collect sensor data, execute process logic, issue control commands, and communicate with the upper control system to ensure the stability and safety of semiconductor processes.
Technical functions and features
Multi channel signal processing
Receive multiple input signals from gas panels, vacuum systems, temperature sensors, power modules, and other sources.
Perform logical judgment and data processing, and issue execution instructions.
Interlocking and Security Control
Built in interlock logic to prevent operation when the chamber does not meet safety conditions or the system is abnormal.
Provide hardware level protection for critical process steps to reduce risks.
Communication and interface capabilities
Support communication with the upper control computer or PLC system to achieve data upload and remote monitoring.
Provide standardized interfaces that are compatible with other AMAT control cards and modules.
modular design
Detachable, replaceable, and upgradable for easy maintenance and functional expansion.
Design to meet the high cleanliness environment and continuous operation requirements of semiconductor equipment.
Application field
CVD/PVD process equipment
Control gas flow rate, chamber pressure, heater, and power module to achieve stable deposition process.
Etching and cleaning equipment
Manage plasma sources, gas inputs, temperature control systems, and actuators to ensure etching/cleaning accuracy.
Wafer Transfer System
Coordinate the operation of Loadlock doors, handling robots, and elevators to ensure the safety of wafer handling.
Automatic production line
Realize automatic monitoring and execution of process parameters, improve equipment operation efficiency and production capacity
AMAT Applied Materials 0225-33921控制器装置 产品展示
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| SC724A001 | CACR-TS111Z1SR | 61-0367-38 |
| SC723B001 | CACR-TM555Z1SP | HSK-0018-60 |
| SC723A-001-PM72032 | CACR-SR06TZ0SM | 879-8103-002A |
| SC723A-001-PM72012 | CACR-SR05SB1AF | 61-0881-20 |
| SC723A-001-PM72004 |  6SC6100-0GB02 | 7LA11 |
| SC723A001 | 6SC6100-0NA21 | 6ES5-456-7LA11 |
| SC723 | SC452-047-05 | SCE905AN-001-01 |
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