AMAT Applied Materials 0010-09181直流电源器 PDF资料
1.产 品 资 料 介 绍:
AMAT Applied Materials 0010-09181 直流电源器
产品概述
0010-09181 是 AMAT 半导体设备中的 直流电源器(DC Power Supply Unit),用于为工艺设备或关键模块提供稳定的直流电压和电流。它通常应用于等离子体电源、静电卡盘、加热器、阀门驱动以及其他需要精确直流电压的半导体工艺单元,保证设备在高精度工艺条件下安全可靠运行。
技术功能与特点
稳定直流输出
提供高精度可调直流电压和电流,满足工艺要求。
输出电压波动小,保证敏感工艺模块的稳定性。
多路输出与控制
支持对多个工艺子系统或负载模块同时供电。
可结合控制器实现远程调节与监控。
保护功能
内置过流、过压、短路保护机制,防止设备损坏。
与互锁系统联动,在异常状态下自动断电。
模块化设计
可快速安装、拆卸和更换,便于维护。
设计适合半导体设备的高洁净、高温环境。
应用领域
等离子体工艺设备
为等离子体源提供直流偏置电压,控制离子能量与轰击强度。
静电卡盘(ESC)系统
为晶圆吸附提供直流电源,确保晶圆在工艺过程中稳定固定。
加热与温控单元
为热离子加热器或电阻加热器提供直流供电,保证温控精度。
阀门与执行器驱动
为气体或液体控制阀门、电磁执行器等提供稳定直流电压,确保流量与压力控制可靠。
自动化晶圆搬运
为机械升降、传输或 Loadlock 系统中的直流电机提供可靠电源。
AMAT Applied Materials 0010-09181直流电源器 英文资料:
AMAT Applied Materials 0010-09181 DC Power Supply Unit
Product Overview
0010-09181 is a DC Power Supply Unit in AMAT semiconductor equipment, used to provide stable DC voltage and current to process equipment or critical modules. It is commonly used in plasma power supplies, electrostatic chucks, heaters, valve drives, and other semiconductor process units that require precise DC voltage to ensure safe and reliable operation of equipment under high-precision process conditions.
Technical functions and features
Stable DC output
Provide high-precision adjustable DC voltage and current to meet process requirements.
The output voltage fluctuation is small, ensuring the stability of sensitive process modules.
Multi channel output and control
Support simultaneous power supply to multiple process subsystems or load modules.
It can be combined with a controller to achieve remote adjustment and monitoring.
protection function
Built in overcurrent, overvoltage, and short-circuit protection mechanisms to prevent equipment damage.
Interlock with the interlocking system to automatically shut down in case of abnormal conditions.
modular design
Can be quickly installed, disassembled, and replaced for easy maintenance.
Design a high cleanliness and high temperature environment suitable for semiconductor equipment.
Application field
Plasma process equipment
Provide a DC bias voltage for the plasma source to control ion energy and bombardment intensity.
Electrostatic Chuck (ESC) System
Provide DC power for wafer adsorption to ensure stable fixation of the wafer during the process.
Heating and temperature control unit
Provide DC power supply for thermal ion heaters or resistance heaters to ensure temperature control accuracy.
Valve and actuator drive
Provide stable DC voltage for gas or liquid control valves, electromagnetic actuators, etc., to ensure reliable flow and pressure control.
Automated wafer handling
Provide reliable power supply for DC motors in mechanical lifting, transmission, or Loadlock systems.
AMAT Applied Materials 0010-09181直流电源器 产品展示
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