AMAT Applied Materials 0010-19188冷却升降机 PDF资料
1.产 品 资 料 介 绍：
AMAT Applied Materials 0010-19188 冷却升降机
产品概述
0010-19188 是 AMAT 半导体工艺设备中的 冷却升降机（Cooling Elevator / Wafer Lift Cooling Unit）。它主要用于晶圆或工艺组件在高温工艺后进行安全、均匀的降温和搬运。该模块集成了机械升降与冷却控制功能，确保晶圆在转移或进入下一工艺步骤时温度可控，避免热应力或损伤。
技术功能与特点
晶圆或组件冷却
通过冷却板或冷却液循环系统，实现晶圆快速均匀降温。
支持温度监控和闭环控制，保证降温曲线符合工艺要求。
升降搬运功能
机械升降装置可将晶圆或载具安全转移到指定位置。
与机器人接口或 Loadlock 系统集成，实现自动化搬运。
安全互锁设计
升降过程与舱门、真空泵、气体供应等系统联锁，防止误动作。
温度异常或机械故障时自动停止操作，保护晶圆和设备。
模块化与维护便利
模块化设计，可快速拆卸、更换或维护，减少停机时间。
结构紧凑，适合半导体洁净室环境。
应用领域
CVD / PVD 工艺设备
在薄膜沉积完成后，提供晶圆均匀降温，避免热应力产生。
与晶圆传输系统结合，实现连续工艺操作。
刻蚀设备
在高温刻蚀结束后对晶圆进行冷却，为后续工艺（如光刻或清洗）做好准备。
晶圆传输与 Loadlock 系统
升降机与 Loadlock 舱门、搬运机器人协作，实现晶圆从真空腔到大气舱的安全温控搬运。
自动化生产线
支持晶圆批量处理，减少人工干预，提高工艺一致性和产能。
AMAT Applied Materials 0010-19188冷却升降机 英文资料：
AMAT Applied Materials 0010-19188 Cooling Lift
Product Overview
0010-19188 is a Cooling Elevator/Wafer Lift Cooling Unit in AMAT semiconductor process equipment. It is mainly used for safe and uniform cooling and handling of wafers or process components after high-temperature processes. This module integrates mechanical lifting and cooling control functions to ensure temperature control of the wafer during transfer or entry into the next process step, avoiding thermal stress or damage.
Technical functions and features
Wafer or component cooling
Through cooling plates or coolant circulation systems, achieve rapid and uniform cooling of wafers.
Support temperature monitoring and closed-loop control to ensure that the cooling curve meets the process requirements.
Lift and transport function
The mechanical lifting device can safely transfer wafers or carriers to designated positions.
Integrate with robot interfaces or Loadlock systems to achieve automated handling.
Security interlock design
The lifting process is interlocked with the cabin door, vacuum pump, gas supply and other systems to prevent misoperation.
Automatically stop operation in case of abnormal temperature or mechanical failure to protect wafers and equipment.
Modularity and easy maintenance
Modular design allows for quick disassembly, replacement, or maintenance, reducing downtime.
Compact structure, suitable for semiconductor cleanroom environment.
Application field
CVD/PVD process equipment
After the thin film deposition is completed, provide uniform cooling of the wafer to avoid the generation of thermal stress.
Combined with wafer transfer system to achieve continuous process operation.
Etching equipment
After the high-temperature etching is completed, the wafer is cooled to prepare for subsequent processes such as photolithography or cleaning.
Wafer Transfer and Loadlock System
The elevator collaborates with Loadlock doors and handling robots to achieve safe temperature controlled handling of wafers from vacuum chambers to atmospheric chambers.
Automatic production line
Support batch processing of wafers, reduce manual intervention, improve process consistency and production capacity.
AMAT Applied Materials 0010-19188冷却升降机 产品展示
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| SGC 110 | AMAT 0100-90859 | 57310255-AX DSRF181A ABB |
| SDO-0824 FC-SDO-0824 | AMAT 0100-35172 | 57520001-FE DSTC 408 ABB |
| SDI-1624 FC-SDI-1624 | AMAT 0100-00730 | PFEA 113-65.1PXC |
| SC756A-001-02 | AMAT 0100-09063 | PFCL 301E-0.5 |
| SC756A-001-01 | AMAT 0100-09235 | PFCL201C20KN |
| SC755B-001-02 | AMAT 0100-35177 | 52820083-LF DSRC113 ABB |
| SC755B-001-01 | AMAT 0100-02139 | PFCL 201CD-50.0KN |
| SC755A-080-02 | AMAT 0100-71141 | PFCL201C 10KN |
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